Inventor · disambiguated record
Chris Bevis
Also filed as: BEVIS CHRIS
8 granted patents·10 citations·filing 2004–2023
81Inventor score
Top patents by PatentIndex Score
8 records- 0191US10056242B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2016·Granted Aug 21, 2018·5 cites·13 claims
- 0286US12165863B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2023·Granted Dec 10, 2024·0 cites·18 claims
- 0382US11764050B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2022·Granted Sep 19, 2023·0 cites·20 claims
- 0476US11430647B2Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass SpectrometryNOVA MEASURING INSTR INC·Filed 2021·Granted Aug 30, 2022·0 cites·21 claims
- 0573US10910208B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2020·Granted Feb 2, 2021·0 cites·20 claims
- 0669US10636644B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2019·Granted Apr 28, 2020·0 cites·7 claims
- 0766US10403489B2Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometryNOVA MEASURING INSTR INC·Filed 2018·Granted Sep 3, 2019·0 cites·22 claims
- 0861US7098456B1Method and apparatus for accurate e-beam metrologyKLA TENCOR TECH CORP·Filed 2004·Granted Aug 29, 2006·5 cites·21 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →