Inventor · disambiguated record
Christopher Campbell
Also filed as: CAMPBELL CHRISTOPHER · CAMPBELL CHRISTOPHER R
9 granted patents·1 pending application·77 citations·filing 2005–2022
86Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT ASS INC6KOO BON-WOONG1SOURCE SENTINEL LLC1TEXAS A & M UNIV SYS1VARIAN SEMICONDUCTOR EQUIPMENT1
Top patents by PatentIndex Score
10 records- 0194US9706634B2Apparatus and techniques to treat substrates using directional plasma and reactive gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jul 11, 2017·12 cites·14 claims
- 0290US10276340B1Low particle capacitively coupled components for workpiece processingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Apr 30, 2019·6 cites·18 claims
- 0389US10004133B2Apparatus and techniques to treat substrates using directional plasma and reactive gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jun 19, 2018·5 cites·18 claims
- 0489US8809800B2Ion source and a method for in-situ cleaning thereofKOO BON-WOONG·Filed 2009·Granted Aug 19, 2014·11 cites·16 claims
- 0588US9142379B2Ion source and a method for in-situ cleaning thereofVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted Sep 22, 2015·7 cites·11 claims
- 0684US7391333B2System for monitoring quality of water systemSOURCE SENTINEL LLC·Filed 2005·Granted Jun 24, 2008·35 cites·27 claims
- 0767US10128082B2Apparatus and techniques to treat substrates using directional plasma and point of use chemistryVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Nov 13, 2018·1 cites·11 claims
- 0860US10600616B2Apparatus and techniques to treat substrates using directional plasma and point of use chemistryVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Mar 24, 2020·0 cites·15 claims
- 0950US2024230624A9Breath capture and analysis system and methodTEXAS A & M UNIV SYS·Filed 2022·Application pending·0 cites
- 1049US10730082B2Apparatus and method for differential in situ cleaningVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Aug 4, 2020·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →