Inventor · disambiguated record
Ching-Yu Chang
Also filed as: CHANG CHING · CHANG CHING Y · CHANG CHING-YU
442 granted patents·171 pending applications·6,442 citations·filing 2000–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD387MACRONIX INT CO LTD66TAIWAN SEMICONDUCTOR MFG65CHANG CHING-YU26WANG CHIEN-WEI10
Top patents by PatentIndex Score
613 records- 0199US9256133B2Apparatus and method for developing processCHANG CHING-YU·Filed 2012·Granted Feb 9, 2016·169 cites·19 claims
- 0299US9223220B2Photo resist baking in lithography processTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Dec 29, 2015·169 cites·20 claims
- 0399US9213234B2Photosensitive material and method of lithographyCHANG CHING-YU·Filed 2012·Granted Dec 15, 2015·169 cites·8 claims
- 0499US9146469B2Middle layer composition for trilayer patterning stackTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 29, 2015·115 cites·7 claims
- 0599US8841058B2Photolithography material for immersion lithography processesCHANG CHING-YU·Filed 2010·Granted Sep 23, 2014·49 cites·9 claims
- 0699US8216767B2Patterning process and chemical amplified photoresist with a photodegradable baseWANG CHIEN-WEI·Filed 2009·Granted Jul 10, 2012·110 cites·19 claims
- 0798US11887851B2Method for forming and using maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 30, 2024·4 cites·20 claims
- 0898US11705332B2Photoresist layer surface treatment, cap layer, and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 18, 2023·9 cites·20 claims
- 0998US9857684B2Silicon-containing photoresist for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 2, 2018·71 cites·20 claims
- 1098US9735047B1Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2016·Granted Aug 15, 2017·30 cites·10 claims
- 1198US9012132B2Coating material and method for photolithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Apr 21, 2015·110 cites·17 claims
- 1298US8802354B2Water mark defect prevention for immersion lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Aug 12, 2014·20 cites·19 claims
- 1398US8715919B2Surface switchable photoresistTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted May 6, 2014·93 cites·20 claims
- 1498US8658344B2Patterning process and photoresist with a photodegradable baseWANG CHIEN-WEI·Filed 2012·Granted Feb 25, 2014·93 cites·19 claims
- 1597US12249507B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 11, 2025·2 cites·20 claims
- 1697US11935757B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Mar 19, 2024·2 cites·20 claims
- 1797US11456266B2Bump structure and method of manufacturing bump structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Sep 27, 2022·3 cites·20 claims
- 1897US10073347B1Semiconductor method of protecting wafer from bevel contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Sep 11, 2018·19 cites·20 claims
- 1997US9236267B2Cut-mask patterning process for fin-like field effect transistor (FinFET) deviceDE HO WEI·Filed 2012·Granted Jan 12, 2016·3.1k cites·20 claims
- 2097US9046789B2Immersion lithography system using a sealed wafer bathLIN BURN JENG·Filed 2012·Granted Jun 2, 2015·12 cites·20 claims
- 2197US8586290B2Patterning process and chemical amplified photoresist compositionWANG CHIEN-WEI·Filed 2009·Granted Nov 19, 2013·34 cites·21 claims
- 2297US8507177B2Photoresist materials and photolithography processesWANG HSIEN-CHENG·Filed 2011·Granted Aug 13, 2013·34 cites·19 claims
- 2397US8415091B2Water mark defect prevention for immersion lithographyCHANG CHING-YU·Filed 2011·Granted Apr 9, 2013·14 cites·12 claims
- 2497US8202680B2TARC material for immersion watermark reductionCHANG CHING-YU·Filed 2011·Granted Jun 19, 2012·16 cites·20 claims
- 2597US7224427B2Megasonic immersion lithography exposure apparatus and methodTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted May 29, 2007·95 cites·31 claims
- 2696US11482411B2Semiconductor device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 25, 2022·3 cites·20 claims
- 2796US11054742B2EUV metallic resist performance enhancement via additivesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 6, 2021·4 cites·20 claims
- 2896US10866511B2Extreme ultraviolet photolithography method with developer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 15, 2020·10 cites·20 claims
- 2996US9459536B1Negative tone developer composition for extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 4, 2016·14 cites·20 claims
- 3096US8767178B2Immersion lithography system using direction-controlling fluid inletsLIN BURN JENG·Filed 2012·Granted Jul 1, 2014·21 cites·17 claims
- 3196US8518628B2Surface switchable photoresistCHANG CHING-YU·Filed 2006·Granted Aug 27, 2013·34 cites·8 claims
- 3295US12057315B2Photoresist layer surface treatment, cap layer, and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Aug 6, 2024·2 cites·20 claims
- 3395US11822237B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 21, 2023·3 cites·20 claims
- 3495US9941157B2Porogen bonded gap filling material in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 10, 2018·9 cites·20 claims
- 3595US9921480B2Extreme ultraviolet photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Mar 20, 2018·7 cites·20 claims
- 3695US9543147B2Photoresist and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 10, 2017·12 cites·22 claims
- 3795US8741551B2Method and composition of a dual sensitive resistWU CHEN-HAU·Filed 2012·Granted Jun 3, 2014·99 cites·16 claims
- 3895US6638441B2Method for pitch reductionMACRONIX INT CO LTD·Filed 2002·Granted Oct 28, 2003·299 cites·20 claims
- 3994US11681226B2Metal-compound-removing solvent and method in lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 20, 2023·2 cites·20 claims
- 4094US11300878B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 12, 2022·6 cites·20 claims
- 4194US10381481B1Multi-layer photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 13, 2019·8 cites·20 claims
- 4294US8741776B2Patterning process for fin-like field effect transistor (finFET) deviceDE HO WEI·Filed 2012·Granted Jun 3, 2014·35 cites·20 claims
- 4394US8658532B2Method and material for forming a double exposure lithography patternCHANG CHING-YU·Filed 2012·Granted Feb 25, 2014·12 cites·20 claims
- 4494US8564759B2Apparatus and method for immersion lithographyCHANG CHING-YU·Filed 2007·Granted Oct 22, 2013·20 cites·20 claims
- 4594US8323870B2Method and photoresist with zipper mechanismLEE FONG-CHENG·Filed 2010·Granted Dec 4, 2012·132 cites·20 claims
- 4694US8208116B2Immersion lithography system using a sealed wafer bathLIN BURN JENG·Filed 2007·Granted Jun 26, 2012·17 cites·28 claims
- 4794US7927779B2Water mark defect prevention for immersion lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Apr 19, 2011·14 cites·24 claims
- 4894US7759253B2Method and material for forming a double exposure lithography patternTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jul 20, 2010·26 cites·17 claims
- 4994US6787013B2BiosensorEUMED BIOTECHNOLOGY CO LTD·Filed 2001·Granted Sep 7, 2004·186 cites·10 claims
- 5093US12222650B2Photoresist underlayer and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 11, 2025·2 cites·20 claims
Showing the top 50 of 613 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Ching-Yu Chang files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →