Inventor · disambiguated record
Chi-Hsiang Fan
Also filed as: FAN CHI-HSIANG
6 granted patents·5 pending applications·16 citations·filing 2011–2023
78Inventor score
Top patents by PatentIndex Score
11 records- 0190US10802409B2Metrology method and apparatus, substrate, lithographic method and associated computer productASML NETHERLANDS BV·Filed 2018·Granted Oct 13, 2020·4 cites·22 claims
- 0286US11392044B2Method of determining a position of a featureASML NETHERLANDS BV·Filed 2020·Granted Jul 19, 2022·2 cites·26 claims
- 0385US10782616B2Automatic selection of metrology target measurement recipesASML NETHERLANDS BV·Filed 2017·Granted Sep 22, 2020·4 cites·20 claims
- 0482US10578980B2Method of determining a position of a featureASML NETHERLANDS BV·Filed 2017·Granted Mar 3, 2020·2 cites·20 claims
- 0580US11281113B2Method for determining stack configuration of substrateASML NETHERLANDS BV·Filed 2019·Granted Mar 22, 2022·3 cites·20 claims
- 0679US11568123B2Method for determining an etch profile of a layer of a wafer for a simulation systemASML NETHERLANDS BV·Filed 2021·Granted Jan 31, 2023·1 cites·20 claims
- 0773US2023144584A1Method for determining an etch profile of a layer of a wafer for a simulation systemASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 0852US2025336046A1System and method for distortion adjustment during inspectionASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0952US2025378548A1Parameterized inspection image simulationASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1049US2012112086A1System and method for estimating change of status of particle beamsTSAI KUEN-YU·Filed 2011·Application pending·0 cites
- 1138US2018239851A1Apparatus and method for inferring parameters of a model of a measurement structure for a patterning processASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →