Inventor · disambiguated record
Charles Hardy
Also filed as: HARDY CHARLES · HARDY CHARLES R · HARDY JR CHARLES R
12 granted patents·578 citations·filing 1976–2021
90Inventor score
Top patents by PatentIndex Score
12 records- 0198US8496756B2Methods for processing substrates in process systems having shared resourcesCRUSE JAMES P·Filed 2010·Granted Jul 30, 2013·518 cites·20 claims
- 0290US11625811B2Adaptive non-rigid targeted deformation of images for synthetic image generationAPPLIED MATERIALS INC·Filed 2021·Granted Apr 11, 2023·2 cites·20 claims
- 0383US11227193B2Automated image measurement for process development and optimizationAPPLIED MATERIALS INC·Filed 2021·Granted Jan 18, 2022·1 cites·20 claims
- 0480US8473247B2Methods for monitoring processing equipmentCRUSE JAMES P·Filed 2010·Granted Jun 25, 2013·5 cites·20 claims
- 0579US8097088B1Methods for processing substrates in a dual chamber processing system having shared resourcesLIM EU JIN·Filed 2011·Granted Jan 17, 2012·6 cites·20 claims
- 0675US4018588AMethod and apparatus for handling slag handlingECOLAIRE INC·Filed 1976·Granted Apr 19, 1977·17 cites·10 claims
- 0773US4915668ABoat tunnel apparatus and methodHARDY CHARLES R·Filed 1988·Granted Apr 10, 1990·24 cites·8 claims
- 0871US10963990B2Automated image measurement for process development and optimizationAPPLIED MATERIALS INC·Filed 2019·Granted Mar 30, 2021·1 cites·20 claims
- 0971US8721798B2Methods for processing substrates in process systems having shared resourcesCRUSE JAMES P·Filed 2010·Granted May 13, 2014·2 cites·16 claims
- 1068US10963753B2Automated image measurement for process development and optimizationAPPLIED MATERIALS INC·Filed 2019·Granted Mar 30, 2021·1 cites·17 claims
- 1168US8527081B2Method and apparatus for automated validation of semiconductor process recipesHARDY CHARLES·Filed 2011·Granted Sep 3, 2013·1 cites·20 claims
- 1264US11545346B2Capacitive sensing data integration for plasma chamber condition monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Jan 3, 2023·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →