Inventor · disambiguated record
Changyoung Jeong
Also filed as: JEONG CHANGYOUNG
12 granted patents·7 pending applications·4 citations·filing 2018–2024
82Inventor score
Files withSAMSUNG ELECTRONICS CO LTD19
Top patents by PatentIndex Score
19 records- 0195US12258494B2Adhesive for pellicle, pellicle for photo mask and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Mar 25, 2025·1 cites·18 claims
- 0277US11493850B2Lithography method using multi-scale simulation, semiconductor device manufacturing method and exposure equipmentSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Nov 8, 2022·2 cites·15 claims
- 0372US10866507B2Pellicle and reticle including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Dec 15, 2020·1 cites·20 claims
- 0468US12281243B2Method of removing an adhesive for an EUV mask and method of reusing an EUV maskSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Apr 22, 2025·0 cites·10 claims
- 0568US11262648B2Pellicle for photomask and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Mar 1, 2022·0 cites·7 claims
- 0666US12346022B2Method of fabricating pellicle structureSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jul 1, 2025·0 cites·20 claims
- 0766US12072637B2Lithography method using multi-scale simulation, semiconductor device manufacturing method and exposure equipmentSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Aug 27, 2024·0 cites·19 claims
- 0865US11448957B2Pellicle transfer apparatus and methodSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Sep 20, 2022·0 cites·19 claims
- 0965US2025138416A1Resist compositions, methods for manufacturing semiconductor devices using the same and multilayered structures formed using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1063US10809614B2Pellicle for photomask and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 20, 2020·0 cites·20 claims
- 1161US12032281B2Pellicle cleaning apparatus and pellicle cleaning method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jul 9, 2024·0 cites·14 claims
- 1259US2024036460A1Protective membrane for photo lithography, pellicle including the same, and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1358US2019390090A1Adhesive for pellicle, pellicle for photo mask and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Application pending·0 cites
- 1456US12099293B2Phase shift mask for extreme ultraviolet lithography and a method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Sep 24, 2024·0 cites·9 claims
- 1555US2021032514A1Adhesive for euv mask, cleaning method of the same, and reusing method of euv mask using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Application pending·0 cites
- 1651US11662665B2Lithography method using multiscale simulation, and method of manufacturing semiconductor device and exposure equipment based on the lithography methodSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted May 30, 2023·0 cites·20 claims
- 1751US2022350240A1Methods of manufacturing a pellicle having graphite layerSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1851US2023408905A1Pellicle for euv exposure and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1940US2020225573A1Pellicle member and reticle assembly including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Changyoung Jeong files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →