Adhesive for pellicle, pellicle for photo mask and method for manufacturing the same

Abstract

An adhesive for a pellicle, the adhesive including a phenol compound, the phenol compound having at least two hydroxyl groups, a polymer having a hydroxyl group or an amine group, and water.

What is claimed is: 
     
         1 . An adhesive for a pellicle, the adhesive comprising:
 a phenol compound, the phenol compound having at least two hydroxyl groups;   a polymer having a hydroxyl group or an amine group; and   water.   
     
     
         2 . The adhesive as claimed in  claim 1 , wherein:
 the phenol compound includes one or more of gallic acid, glucogallin, di-galloylglucose, tri-galloylglucose, tetra-galloylglucose, m-trigallic acid, tannic acid, or ellagic acid, and   the polymer includes polyvinylalcohol.   
     
     
         3 . The adhesive as claimed in  claim 2 , comprising:
 about 1% to about 30% by weight of the phenol compound,   about 1% to about 40% by weight of the polyvinylalcohol, and   a remainder of the water.   
     
     
         4 . The adhesive as claimed in  claim 2 , comprising:
 about 1% to about 15% by weight of the phenol compound,   about 20% to about 40% by weight of the polyvinylalcohol,   about 0.05% to about 1% by weight of silica particles, and   a remainder of the water.   
     
     
         5 . The adhesive as claimed in  claim 2 , wherein a weight average molecular weight of the polyvinylalcohol is about 8,000 to about 70,000. 
     
     
         6 . The adhesive as claimed in  claim 1 , wherein:
 the phenol compound includes pyrogallol, and   the polymer includes polyethylene imine.   
     
     
         7 . The adhesive as claimed in  claim 6 , comprising:
 about 0.01 M to about 0.2 M of the pyrogallol,   about 1% to about 20% by weight of the polyethylene imine, and   a remainder of the water:   
     
     
         8 . The adhesive as claimed in  claim 6 , comprising:
 about 0.01 M to about 0.2 M of the pyrogallol,   about 1% to about 20% by weight of the polyethylene imine,   about 0.001% to about 0.1% by weight of silica particles, and   a remainder of the water.   
     
     
         9 . The adhesive as claimed in  claim 6 , wherein a weight average molecular weight of the polyethylene imine is about 8,000 to about 70,000. 
     
     
         10 . A pellicle for protecting a photo mask, the pellicle comprising:
 a pellicle membrane that is transparent;   a frame supporting the pellicle membrane; and   a membrane adhesive layer combining the pellicle membrane with the frame,   wherein the membrane adhesive layer includes a cross-linked structure formed from the adhesive as claimed in  claim 1 .   
     
     
         11 . The pellicle as claimed in  claim 10 , wherein the pellicle membrane includes one or more of silicon, a carbon material, a semiconductive material, or a fluorine-containing polymer. 
     
     
         12 . The pellicle as claimed in  claim 10 , wherein the pellicle membrane includes one or more of amorphous carbon, graphene, nanometer-thickness graphite, carbon nanosheet, carbon nanotube, SiC, or B 4 C. 
     
     
         13 . The pellicle as claimed in  claim 10 , wherein:
 the adhesive includes one or more of gallic acid, glucogallin, di-galloylglucose, tri-galloylglucose, tetra-galloylglucose, m-trigallic acid, tannic acid, or ellagic acid as the phenol compound,   the adhesive includes polyvinyl alcohol as the polymer having a hydroxyl group, and   the membrane adhesive layer includes a cross-linked structure of the polyvinyl alcohol and the phenol compound.   
     
     
         14 . The pellicle as claimed in  claim 10 , wherein:
 the adhesive includes pyrogallol as the phenol compound, and   the membrane adhesive layer includes a cross-linked structure of a catecholamine compound formed by reaction of polyethylene imine and the pyrogallol.   
     
     
         15 . The pellicle as claimed in  claim 10 , further comprising a mask adhesive layer combining the frame with the photo mask. 
     
     
         16 . The pellicle as claimed in  claim 15 , wherein the mask adhesive layer includes a same adhesive as the membrane adhesive layer. 
     
     
         17 . The pellicle as claimed in  claim 10 , wherein the pellicle membrane has a light transmittance equal to or more than about 80% for extreme ultraviolet radiation (EUV). 
     
     
         18 . A method for manufacturing a pellicle for a photo mask, the method comprising:
 providing the adhesive as claimed in  claim 1  on a surface of a frame to form a coating layer;   bringing a pellicle membrane into contact with the coating layer; and   drying the coating layer to form a membrane adhesive layer including a cross-linked structure.   
     
     
         19 . The method as claimed in  claim 18 , wherein the adhesive includes:
 about 1% to about 15% by weight of tannic acid as the phenol compound.   about 20% to about 40% by weight of polyvinylalcohol as the polymer having a hydroxyl group,   about 0.05% to about 1% by weight of silica particles, and   a remainder of water.   
     
     
         20 . The method as claimed in  claim 18 , wherein the adhesive includes:
 about 0.01 M to about 0.2 M of pyrogallol as the phenol compound,   about 1% to about 20% by weight of polyethylene imine as the polymer having an amine group,   about 0.001% to about 0.1% by weight of silica particles, and   a remainder of water.