Inventor · disambiguated record
Chishio Koshimizu
Also filed as: KOSHIMIZU CHISHIO
163 granted patents·71 pending applications·4,513 citations·filing 1986–2025
99Inventor score
Top patents by PatentIndex Score
234 records- 0199US8343306B2Plasma processing apparatus and method of plasma distribution correctionTOKYO ELECTRON LTD·Filed 2008·Granted Jan 1, 2013·81 cites·5 claims
- 0298US11476089B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Oct 18, 2022·7 cites·27 claims
- 0398US9941097B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Apr 10, 2018·110 cites·8 claims
- 0498US9313872B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2010·Granted Apr 12, 2016·52 cites·27 claims
- 0598US7951262B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted May 31, 2011·486 cites·21 claims
- 0698US6214162B1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Apr 10, 2001·159 cites·9 claims
- 0798US6162323APlasma processing apparatusTOKYO ELECTRON YAMANASHI LTD·Filed 1998·Granted Dec 19, 2000·753 cites·20 claims
- 0898US5571366APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Nov 5, 1996·502 cites·21 claims
- 0997US12249486B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2023·Granted Mar 11, 2025·2 cites·9 claims
- 1097US12249487B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2023·Granted Mar 11, 2025·2 cites·18 claims
- 1197US12165842B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Dec 10, 2024·2 cites·26 claims
- 1297US11742182B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Aug 29, 2023·3 cites·54 claims
- 1397US11742181B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Aug 29, 2023·5 cites·33 claims
- 1497US8603293B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Granted Dec 10, 2013·73 cites·22 claims
- 1597US8298371B2Plasma processing apparatusKOSHIMIZU CHISHIO·Filed 2008·Granted Oct 30, 2012·26 cites·5 claims
- 1697US7988816B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Aug 2, 2011·63 cites·22 claims
- 1796US10672589B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2019·Granted Jun 2, 2020·45 cites·19 claims
- 1896US7415940B2Plasma processorTOKYO ELECTRON LTD·Filed 2002·Granted Aug 26, 2008·75 cites·32 claims
- 1995US11871503B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jan 9, 2024·2 cites·9 claims
- 2095US10325758B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jun 18, 2019·13 cites·23 claims
- 2195US9997332B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Jun 12, 2018·11 cites·6 claims
- 2295US7740737B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Jun 22, 2010·25 cites·14 claims
- 2395US6000360APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Dec 14, 1999·102 cites·17 claims
- 2495US5980767AMethod and devices for detecting the end point of plasma processTOKYO ELECTRON LTD·Filed 1997·Granted Nov 9, 1999·116 cites·13 claims
- 2595US5290383APlasma-process system with improved end-point detecting schemeTOKYO ELECTRON LTD·Filed 1993·Granted Mar 1, 1994·198 cites·9 claims
- 2694US12176187B2Cleaning method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Dec 24, 2024·1 cites·18 claims
- 2794US11532456B2Inspection method, inspection apparatus, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Dec 20, 2022·4 cites·20 claims
- 2894US11361947B2Apparatus for plasma processing and method of etchingTOKYO ELECTRON LTD·Filed 2019·Granted Jun 14, 2022·4 cites·17 claims
- 2994US11315765B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Apr 26, 2022·8 cites·7 claims
- 3094US8894806B2Plasma processing apparatus and plasma processing methodKOSHIMIZU CHISHIO·Filed 2010·Granted Nov 25, 2014·22 cites·10 claims
- 3193US11742183B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2021·Granted Aug 29, 2023·3 cites·16 claims
- 3293US11574798B2Plasma processing apparatus and control methodTOKYO ELECTRON LTD·Filed 2020·Granted Feb 7, 2023·3 cites·24 claims
- 3393US9253867B2Plasma processing apparatus and plasma processing methodYAMAZAWA YOHEI·Filed 2010·Granted Feb 2, 2016·11 cites·10 claims
- 3493US9111747B2Film deposition apparatus, substrate processing apparatus and film deposition methodTOKYO ELECTRON LTD·Filed 2013·Granted Aug 18, 2015·15 cites·17 claims
- 3593US8137471B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2010·Granted Mar 20, 2012·12 cites·22 claims
- 3693US7446881B2System, apparatus, and method for determining temperature/thickness of an object using light interference measurementsTOKYO ELECTRON LTD·Filed 2006·Granted Nov 4, 2008·30 cites·36 claims
- 3793US5997687APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Dec 7, 1999·141 cites·23 claims
- 3892US5565114AMethod and device for detecting the end point of plasma processTOKYO ELECTRON LTD·Filed 1994·Granted Oct 15, 1996·78 cites·14 claims
- 3991US12300465B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted May 13, 2025·1 cites·7 claims
- 4091US8741095B2Plasma processing apparatus, plasma processing method, and computer readable storage mediumKOSHIMIZU CHISHIO·Filed 2009·Granted Jun 3, 2014·16 cites·9 claims
- 4191US7582182B2Method and apparatus for measuring electron density of plasma and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Sep 1, 2009·14 cites·6 claims
- 4290US8293068B2Plasma processing apparatusKOSHIMIZU CHISHIO·Filed 2009·Granted Oct 23, 2012·17 cites·12 claims
- 4390US6426477B1Plasma processing method and apparatus for eliminating damages in a plasma process of a substrateTOKYO ELECTRON LTD·Filed 2000·Granted Jul 30, 2002·32 cites·16 claims
- 4490US2025062101A1Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4589US9490105B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2013·Granted Nov 8, 2016·6 cites·19 claims
- 4689US9349618B2Substrate processing apparatusYAMAWAKU JUN·Filed 2012·Granted May 24, 2016·10 cites·4 claims
- 4789US8251011B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2007·Granted Aug 28, 2012·13 cites·19 claims
- 4889US6576860B2Plasma processing method and apparatus for eliminating damages in a plasma process of a substrateTOKYO ELECTRON LTD·Filed 2002·Granted Jun 10, 2003·28 cites·6 claims
- 4989US5935373APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Aug 10, 1999·117 cites·19 claims
- 5089US2025308844A1Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
Showing the top 50 of 234 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →