Inventor · disambiguated record
Chun-Hung Lee
Also filed as: LEE CHUN-HUNG
67 granted patents·24 pending applications·630 citations·filing 2001–2025
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD48MACRONIX INT CO LTD8TAIWAN SEMICONDUCTOR MFG5TYAN COMPUTER CORP4LEE CHUN-HUNG3
Top patents by PatentIndex Score
91 records- 0198US9224833B2Method of forming a vertical deviceTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Dec 29, 2015·33 cites·20 claims
- 0298US7910453B2Storage nitride encapsulation for non-planar sonos NAND flash charge retentionTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Mar 22, 2011·396 cites·18 claims
- 0397US9536980B1Gate spacers and methods of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 3, 2017·44 cites·20 claims
- 0494US11916131B2Vertical device having a protrusion sourceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 27, 2024·2 cites·20 claims
- 0594US9934971B2Method of forming an integrated circuit using a patterned mask layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 3, 2018·6 cites·20 claims
- 0693US9640398B2Method of forming an integrated circuit using a patterned mask layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted May 2, 2017·6 cites·20 claims
- 0793US9633907B2Self-aligned nanowire formation using double patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Apr 25, 2017·10 cites·20 claims
- 0892US11462408B2Method of forming an integrated circuit using a patterned mask layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 4, 2022·2 cites·20 claims
- 0992US10505014B2Vertical device having a protrusion sourceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 10, 2019·4 cites·17 claims
- 1092US8772183B2Method of forming an integrated circuitHSIEH TZU-YEN·Filed 2011·Granted Jul 8, 2014·11 cites·20 claims
- 1190US12349435B2Vertical device having a protrusion sourceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 1, 2025·0 cites·20 claims
- 1290US11749681B2Fin field-effect transistor and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 5, 2023·2 cites·20 claims
- 1390US10665457B2Method of forming an integrated circuit using a patterned mask layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 26, 2020·3 cites·20 claims
- 1490US2025311351A1Vertical Device Having a Protrusion SourceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1589US11120997B2Surface treatment for etch tuningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 14, 2021·6 cites·20 claims
- 1689US10854728B2Vertical device having a protrusion structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 1, 2020·2 cites·20 claims
- 1786US11948722B2Planar winding transformerCHICONY POWER TECH CO LTD·Filed 2021·Granted Apr 2, 2024·1 cites·13 claims
- 1886US9570358B2Nano wire structure and method for fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Feb 14, 2017·3 cites·20 claims
- 1986US9059085B2Method of forming an integrated circuit using a patterned mask layerTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Jun 16, 2015·4 cites·20 claims
- 2085US10879129B2Self-aligned nanowire formation using double patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 29, 2020·2 cites·20 claims
- 2185US9412614B2Nano wire structure and method for fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 9, 2016·4 cites·20 claims
- 2284US9472414B2Self-aligned multiple spacer patterning processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 18, 2016·4 cites·20 claims
- 2384US2024395598A1Semiconductor Device and MethodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2483US12027370B2Method of forming an integrated circuit using a patterned mask layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 2, 2024·0 cites·20 claims
- 2583US7619900B2Dual-board case for multi-mainboard systemMITAC INT CORP·Filed 2007·Granted Nov 17, 2009·12 cites·21 claims
- 2682US12057342B2Semiconductor device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 6, 2024·0 cites·20 claims
- 2782US10468308B2FinFET structures and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 5, 2019·2 cites·20 claims
- 2881US7939451B2Method for fabricating a patternMACRONIX INT CO LTD·Filed 2007·Granted May 10, 2011·8 cites·18 claims
- 2979US9590090B2Method of forming channel of gate structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 7, 2017·3 cites·20 claims
- 3078US10170367B2Semiconductor device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 1, 2019·2 cites·20 claims
- 3178US7710731B2Chassis partition framework for personal cluster computerMITAC INT CORP·Filed 2007·Granted May 4, 2010·10 cites·19 claims
- 3277US11121039B2FinFET structures and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 14, 2021·1 cites·20 claims
- 3376US10163723B2Self-aligned nanowire formation using double patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 25, 2018·1 cites·20 claims
- 3476US9741621B2Nano wire structure and method for fabricating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Aug 22, 2017·1 cites·20 claims
- 3576US7206104B2Method for automatically determining document position in a scanner windowLEE CHUN-HUNG·Filed 2002·Granted Apr 17, 2007·14 cites·20 claims
- 3675US2025364259A1Semiconductor fin cut process and structures formed therebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3774US11527430B2Semiconductor device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 13, 2022·0 cites·20 claims
- 3872US9176388B2Multi-line width pattern created using photolithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Nov 3, 2015·2 cites·19 claims
- 3972US2024321642A1Semiconductor devices and methods of manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4070US9899266B2FinFET structures and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Feb 20, 2018·1 cites·20 claims
- 4170US2024387548A1Fin field-effect transistor and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4267US7435681B2Methods of etching stacks having metal layers and hard mask layersMACRONIX INT CO LTD·Filed 2006·Granted Oct 14, 2008·2 cites·20 claims
- 4366US11127837B2Method of forming MOSFET structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 21, 2021·0 cites·20 claims
- 4466US9685332B2Iterative self-aligned patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jun 20, 2017·1 cites·19 claims
- 4566US2024312788A1Semiconductor fin cut process and structures formed therebyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4665US12136624B2Fin Field-Effect Transistor and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 5, 2024·0 cites·20 claims
- 4765US10847409B2Semiconductor device and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Nov 24, 2020·0 cites·20 claims
- 4864US10504792B2Self-aligned nanowire formation using double patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 10, 2019·0 cites·20 claims
- 4963US7550390B2Method and apparatus for dielectric etching during integrated circuit fabricationMACRONIX INT CO LTD·Filed 2006·Granted Jun 23, 2009·2 cites·20 claims
- 5062US6670275B2Method of rounding a topcorner of trenchMACRONIX INT CO LTD·Filed 2002·Granted Dec 30, 2003·10 cites·2 claims
Showing the top 50 of 91 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →