Inventor · disambiguated record
Chung-Hsun Li
Also filed as: LI CHUNG-HSUN
8 granted patents·3 pending applications·9 citations·filing 2011–2023
80Inventor score
Files withASML NETHERLANDS BV11
Top patents by PatentIndex Score
11 records- 0190US10996176B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2020·Granted May 4, 2021·2 cites·19 claims
- 0289US10317191B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2017·Granted Jun 11, 2019·4 cites·21 claims
- 0385US10746668B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2019·Granted Aug 18, 2020·2 cites·27 claims
- 0476US12204252B2Method for decision making in a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2023·Granted Jan 21, 2025·0 cites·20 claims
- 0576US11687007B2Method for decision making in a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2020·Granted Jun 27, 2023·1 cites·20 claims
- 0674US11977034B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2021·Granted May 7, 2024·0 cites·18 claims
- 0759US11774869B2Method and system for determining overlayASML NETHERLANDS BV·Filed 2020·Granted Oct 3, 2023·0 cites·14 claims
- 0855US11774861B2Calibration method for a lithographic systemASML NETHERLANDS BV·Filed 2020·Granted Oct 3, 2023·0 cites·16 claims
- 0950US2023341783A1Determining lithographic matching performanceASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1040US2011273685A1Production of an alignment markASML NETHERLANDS BV·Filed 2011·Application pending·0 cites
- 1133US2019384164A1Method of determining pellicle degradation compensation corrections, and associated lithographic apparatus and computer programASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →