Inventor · disambiguated record
Cheng-Ming Lin
Also filed as: LIN CHENG-MING
72 granted patents·50 pending applications·77 citations·filing 2002–2025
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD83TAIWAN SEMICONDUCTOR MFG16AIDMICS BIOTECHNOLOGY CO LTD11LIN CHENG-MING3HEWLETT PACKARD DEVELOPMENT CO2
Top patents by PatentIndex Score
122 records- 0198US11018232B2Semiconductor device and fabrication method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 25, 2021·5 cites·20 claims
- 0295US12107134B2Semiconductor device and fabrication method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 1, 2024·1 cites·20 claims
- 0392US11018256B2Selective internal gate structure for ferroelectric semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 25, 2021·4 cites·20 claims
- 0490US12336235B2Semiconductor device having isolation structure formed of low-k dielectric material and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 17, 2025·1 cites·14 claims
- 0590US11796909B2Structure and method of reticle pod having inspection windowTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 24, 2023·1 cites·20 claims
- 0690US11209736B2Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 28, 2021·5 cites·20 claims
- 0789US11594633B2Selective internal gate structure for ferroelectric semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 28, 2023·1 cites·20 claims
- 0888US11314164B2Structure and method of reticle pod having inspection windowTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 26, 2022·3 cites·20 claims
- 0986US12218225B1Radical treatment in supercritical fluid for gate dielectric quality improvement to CFET structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 4, 2025·0 cites·20 claims
- 1086US12136570B2Graphene layer for low resistance contacts and damascene interconnectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 5, 2024·1 cites·20 claims
- 1186US2024395882A1Semiconductor device and fabrication method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1286US2024385507A1Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1385US10495863B2Portable microscope deviceAIDMICS BIOTECHNOLOGY CO LTD·Filed 2015·Granted Dec 3, 2019·7 cites·19 claims
- 1484US12124163B2Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 22, 2024·0 cites·20 claims
- 1584US12034058B2Gate stack treatment for ferroelectric transistorsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 9, 2024·0 cites·20 claims
- 1684US11402743B2Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 2, 2022·1 cites·20 claims
- 1784US2024322000A1Gate stack treatment for ferroelectric transistorsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1884US2025311271A1Fabrication of field effect transistors with ferroelectric materialsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1983US12278287B2Selective internal gate structure for ferroelectric semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 15, 2025·0 cites·20 claims
- 2083US12248245B2Structure and method of reticle pod having inspection windowTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Mar 11, 2025·0 cites·20 claims
- 2182US2025220980A1Selective internal gate structure for ferroelectric semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2281US10508953B2Method and system for processing substrate by chemical solution in semiconductor manufacturing fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 17, 2019·3 cites·20 claims
- 2381US2025366185A1P-dipole material for stacked transistorsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2481US2025357124A1N-dipole material for stacked transistorsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2580US12055850B2Fabricating method of photomask, photomask structure thereof, and semiconductor manufacturing method using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Aug 6, 2024·0 cites·20 claims
- 2680US11860530B2Mask defect preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 2, 2024·0 cites·20 claims
- 2780US8268541B2Mask and blank storage inner gasLIN CHENG-MING·Filed 2007·Granted Sep 18, 2012·6 cites·10 claims
- 2879US12411404B2Method of manufacturing phase shift photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Sep 9, 2025·0 cites·20 claims
- 2979US2025351569A1Dipole-first approach to fabricate a top-tier device of a complementary field effect transistor (cfet)TAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3078US10495868B2Sample carrying module and portable microscope using the sameAIDMICS BIOTECHNOLOGY CO LTD·Filed 2017·Granted Dec 3, 2019·3 cites·19 claims
- 3178US2024186414A1Ferroelectric structure for semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3278US2025169092A1Radical Treatment in Supercritical Fluid for Gate Dielectric Quality Improvement to CFET StructureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3378US2025357111A1Dielectric densificationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3478US2025221004A1Finfet having a work function material gradientTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3577US10665685B2Semiconductor device and fabrication method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 26, 2020·1 cites·20 claims
- 3677US2025351548A1Dielectric materials for stacked transistor structures and related methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3777US2025180984A1Structure and method of reticle pod having inspection windowTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3876US11621338B2Gate stack treatment for ferroelectric transistorsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 4, 2023·0 cites·20 claims
- 3975US11855164B2Semiconductor device and fabrication method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 26, 2023·0 cites·20 claims
- 4075US2024395901A1Semiconductor device, and method for protecting low-k dielectric feature of semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4175US2025336762A1Integrated circuit device with thermoelectric coolingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4275US2025351568A1Complementary field-effect transistor devices and methods of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4374US12283616B2FinFET having a work function material gradientTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 22, 2025·0 cites·20 claims
- 4474US11901450B2Ferroelectric structure for semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 13, 2024·0 cites·20 claims
- 4574US11282933B2FinFET having a work function material gradientTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Mar 22, 2022·1 cites·20 claims
- 4674US11139397B2Self-aligned metal compound layers for semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 5, 2021·1 cites·20 claims
- 4774US2025216791A1Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4874US2025169091A1Radical Treatment in Supercritical Fluid for Gate Dielectric Quality Improvement to CFET StructureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 4974US2025275195A1Manufacturing method of semiconductor device having isolation structure formed of low-k dielectric materialTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 5073US12282260B2Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 22, 2025·0 cites·20 claims
Showing the top 50 of 122 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →