Inventor · disambiguated record
Chin-Hsiang Lin
Also filed as: LIN CHIN-HSIANG
357 granted patents·71 pending applications·4,848 citations·filing 1998–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD236TAIWAN SEMICONDUCTOR MFG72UNITED MICROELECTRONICS CORP10LIN CHIN-HSIANG9YEH MING-HSI7
Top patents by PatentIndex Score
428 records- 0199US9105490B2Contact structure of semiconductor deviceTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Aug 11, 2015·1.6k cites·19 claims
- 0299US8823065B2Contact structure of semiconductor deviceTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Sep 2, 2014·1.3k cites·16 claims
- 0398US11342193B2Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 24, 2022·4 cites·20 claims
- 0498US7202148B2Method utilizing compensation features in semiconductor processingTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Apr 10, 2007·379 cites·17 claims
- 0597US12249507B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 11, 2025·2 cites·20 claims
- 0697US11935757B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Mar 19, 2024·2 cites·20 claims
- 0797US11320747B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 3, 2022·3 cites·20 claims
- 0897US10073347B1Semiconductor method of protecting wafer from bevel contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Sep 11, 2018·19 cites·20 claims
- 0997US9985134B1FinFETs and methods of forming FinFETsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 29, 2018·18 cites·20 claims
- 1097US8507177B2Photoresist materials and photolithography processesWANG HSIEN-CHENG·Filed 2011·Granted Aug 13, 2013·34 cites·19 claims
- 1197US7224427B2Megasonic immersion lithography exposure apparatus and methodTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted May 29, 2007·95 cites·31 claims
- 1296US10866511B2Extreme ultraviolet photolithography method with developer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 15, 2020·10 cites·20 claims
- 1396US9214556B2Self-aligned dual-metal silicide and germanide formationTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Dec 15, 2015·23 cites·20 claims
- 1496US8946828B2Semiconductor device having elevated structure and method of manufacturing the sameSUN SEY-PING·Filed 2010·Granted Feb 3, 2015·83 cites·15 claims
- 1595US12050399B2Pellicle assembly and method of making sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 30, 2024·2 cites·20 claims
- 1695US11664268B2Dummy fin structures and methods of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted May 30, 2023·2 cites·20 claims
- 1795US11092899B2Method for mask data synthesis with wafer target adjustmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 17, 2021·7 cites·20 claims
- 1895US10790155B2Method of manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 29, 2020·7 cites·20 claims
- 1995US8623468B2Methods of fabricating metal hard masksLIN SU-HORNG·Filed 2012·Granted Jan 7, 2014·49 cites·18 claims
- 2095US7517746B2Metal oxide semiconductor transistor with Y shape metal gate and fabricating method thereofUNITED MICROELECTRONICS CORP·Filed 2007·Granted Apr 14, 2009·31 cites·16 claims
- 2195US6638879B2Method for forming nitride spacer by using atomic layer depositionMACRONIX INT CO LTD·Filed 2001·Granted Oct 28, 2003·108 cites·16 claims
- 2294US11437161B1Lithography apparatus and method for using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 6, 2022·2 cites·20 claims
- 2394US11300878B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 12, 2022·6 cites·20 claims
- 2494US10520813B2Extreme ultraviolet photoresist with high-efficiency electron transferTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 31, 2019·4 cites·19 claims
- 2594US10510580B2Dummy fin structures and methods of forming sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 17, 2019·8 cites·20 claims
- 2694US10381481B1Multi-layer photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 13, 2019·8 cites·20 claims
- 2794US10162258B2Pellicle fabrication methods and structures thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·8 cites·20 claims
- 2894US10049918B2Directional patterning methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Aug 14, 2018·9 cites·20 claims
- 2994US8944739B2Loadport bridge for semiconductor fabrication toolsCHEN SHIH-HUNG·Filed 2012·Granted Feb 3, 2015·18 cites·19 claims
- 3094US8703368B2Lithography processLEE YUNG-YAO·Filed 2012·Granted Apr 22, 2014·14 cites·20 claims
- 3194US8088685B2Integration of bottom-up metal film depositionLIN SIMON SU-HORNG·Filed 2010·Granted Jan 3, 2012·23 cites·20 claims
- 3293US11822238B2Extreme ultraviolet photolithography method with developer compositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 21, 2023·2 cites·20 claims
- 3393US11709435B2Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 25, 2023·1 cites·20 claims
- 3493US11029602B2Photoresist composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 8, 2021·4 cites·20 claims
- 3593US10658184B2Pattern fidelity enhancement with directional patterning technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 19, 2020·7 cites·12 claims
- 3693US10515812B1Methods of reducing pattern roughness in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 24, 2019·6 cites·20 claims
- 3793US9099494B2Contact structure of semiconductor deviceTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted Aug 4, 2015·6 cites·20 claims
- 3893US6982135B2Pattern compensation for stitchingTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jan 3, 2006·54 cites·18 claims
- 3992US11971657B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 30, 2024·1 cites·20 claims
- 4092US11411113B2FinFETs and methods of forming FinFETsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 9, 2022·2 cites·20 claims
- 4192US10866517B2Lithography techniques for reducing resist swellingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 15, 2020·3 cites·20 claims
- 4292US10672610B2Grafting design for pattern post-treatment in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 2, 2020·4 cites·20 claims
- 4392US8199314B2System and method for improving immersion scanner overlay performancePENG JUI-CHUNG·Filed 2011·Granted Jun 12, 2012·12 cites·20 claims
- 4492US8119473B2High temperature anneal for aluminum surface protectionHUANG KUO BIN·Filed 2009·Granted Feb 21, 2012·30 cites·15 claims
- 4592US2025362598A1Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4691US10520822B2Lithography techniques for reducing resist swellingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 31, 2019·3 cites·20 claims
- 4791US10164114B2FinFETs and methods of forming FinFETsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 25, 2018·4 cites·20 claims
- 4891US9840778B2Plasma chamber having an upper electrode having controllable valves and a method of using the sameSU YEN-SHUO·Filed 2012·Granted Dec 12, 2017·6 cites·20 claims
- 4991US9589838B2Contact structure of semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 7, 2017·5 cites·20 claims
- 5091US8629426B2Source/drain stressor having enhanced carrier mobility manufacturing sameLIN CHIN-HSIANG·Filed 2010·Granted Jan 14, 2014·11 cites·13 claims
Showing the top 50 of 428 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →