Inventor · disambiguated record
Christoph Noelscher
Also filed as: NOELSCHER CHRISTOPH
13 granted patents·15 pending applications·53 citations·filing 1991–2010
89Inventor score
Top patents by PatentIndex Score
28 records- 0175US8043794B2Method of double patterning, method of processing a plurality of semiconductor wafers and semiconductor deviceQIMONDA AG·Filed 2008·Granted Oct 25, 2011·6 cites·24 claims
- 0273US7759242B2Method of fabricating an integrated circuitQIMONDA AG·Filed 2007·Granted Jul 20, 2010·4 cites·34 claims
- 0370US7370313B2Method for optimizing a photolithographic maskINFINEON TECHNOLOGIES AG·Filed 2005·Granted May 6, 2008·4 cites·49 claims
- 0468US8293431B2Lithographic mask and method of forming a lithographic maskROLFF HAIKO·Filed 2010·Granted Oct 23, 2012·3 cites·23 claims
- 0566US7825031B2Method of fabricating a semiconductor deviceQIMONDA AG·Filed 2007·Granted Nov 2, 2010·2 cites·30 claims
- 0666US7794614B2Methods for generating sublithographic structuresQIMONDA AG·Filed 2007·Granted Sep 14, 2010·3 cites·23 claims
- 0766US7737049B2Method for forming a structure on a substrate and deviceQIMONDA AG·Filed 2007·Granted Jun 15, 2010·2 cites·23 claims
- 0864US5397664APhase mask for projection lithography and method for the manufacture thereofSIEMENS AG·Filed 1993·Granted Mar 14, 1995·18 cites·11 claims
- 0955US7767571B2Method for manufacturing a structure in a semiconductor device and a structure in a semiconductor deviceQIMONDA AG·Filed 2006·Granted Aug 3, 2010·2 cites·23 claims
- 1051US2007105043A1Photosensitive coating for enhancing a contrast of a photolithographic exposureELIAN KLAUS·Filed 2006·Application pending·0 cites
- 1147US5284724APhase mask for projection lithography and method for the manufacture thereof comprising a selectively etchable phase shift layer directly on substrateSIEMENS AG·Filed 1991·Granted Feb 8, 1994·9 cites·6 claims
- 1246US2009219496A1Methods of Double Patterning, Photo Sensitive Layer Stack for Double Patterning and System for Double PatterningKAMM FRANK-MICHAEL·Filed 2008·Application pending·0 cites
- 1345US7535044B2Semiconductor device, method for manufacturing a semiconductor device and mask for manufacturing a semiconductor deviceQIMONDA AG·Filed 2007·Granted May 19, 2009·0 cites·23 claims
- 1441US2008061338A1Method for Processing a Structure of a Semiconductor Component, and Structure in a Semiconductor ComponentLATTARD LUDOVIC·Filed 2007·Application pending·0 cites
- 1541US2009239314A1Methods of Manufacturing a Semiconductor DeviceHABERJAHN MARTIN·Filed 2008·Application pending·0 cites
- 1641US2007092829A1Photosensitive coating for enhancing a contrast of a photolithographic exposureNOELSCHER CHRISTOPH·Filed 2005·Application pending·0 cites
- 1740US2010048023A1Methods for Manufacturing a Structure on a Substrate and Intermediate ProductNOELSCHER CHRISTOPH·Filed 2008·Application pending·0 cites
- 1839US7011909B2Photolithography mask and method of fabricating a photolithography maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Mar 14, 2006·0 cites·30 claims
- 1939US2003054214A1Power generation plant and method of generating electric energyFiled 2001·Application pending·0 cites
- 2038US2007037071A1Method for removing defect material of a lithography maskQIMONDA AG·Filed 2006·Application pending·0 cites
- 2138US2009127722A1Method for Processing a Spacer Structure, Method of Manufacturing an Integrated Circuit, Semiconductor Device and Intermediate Structure with at Least One Spacer StructureNOELSCHER CHRISTOPH·Filed 2007·Application pending·0 cites
- 2237US2009111274A1Methods of Manufacturing a Semiconductor Device and Apparatus and Etch Chamber for the Manufacturing of Semiconductor DevicesNOELSCHER CHRISTOPH·Filed 2007·Application pending·0 cites
- 2335US2003145596A1Method for operating a steam turbine installation and a steam turbine installation that functions according theretoFiled 2000·Application pending·0 cites
- 2434US2007187272A1Device for the storage and use of at least one photomask for lithographic projection and method for using the device in an exposure installationBONNESS ANJA·Filed 2006·Application pending·0 cites
- 2534US2006268248A1Lithographic projection apparatus and method of exposing a semiconductor wafer with a pattern from a maskNOELSCHER CHRISTOPH·Filed 2006·Application pending·0 cites
- 2634US2007117041A1Photosensitive coating for enhancing a contrast of a photolithographic exposureNOELSCHER CHRISTOPH·Filed 2005·Application pending·0 cites
- 2727US7872729B2Filter system for light sourceNOELSCHER CHRISTOPH·Filed 2006·Granted Jan 18, 2011·0 cites·37 claims
- 2827US2002189262A1Method for operating a steam turbine , and a turbine system provided with a steam turbine that functions according to said methodFiled 2000·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →