Inventor · disambiguated record
Charles S. Rhoades
Also filed as: RHOADES CHARLES S · RHOADES CHARLES STEVEN
10 granted patents·584 citations·filing 1991–1997
93Inventor score
Files withAPPLIED MATERIALS INC10
Top patents by PatentIndex Score
10 records- 0191US5545289APassivating, stripping and corrosion inhibition of semiconductor substratesAPPLIED MATERIALS INC·Filed 1994·Granted Aug 13, 1996·184 cites·91 claims
- 0286US5494523AControlling plasma particulates by contouring the plasma sheath using materials of differing RF impedancesAPPLIED MATERIALS INC·Filed 1995·Granted Feb 27, 1996·53 cites·4 claims
- 0386US5486235APlasma dry cleaning of semiconductor processing chambersAPPLIED MATERIALS INC·Filed 1993·Granted Jan 23, 1996·74 cites·2 claims
- 0477US5221424AMethod for removal of photoresist over metal which also removes or inactivates corosion-forming materials remaining from previous metal etchAPPLIED MATERIALS INC·Filed 1991·Granted Jun 22, 1993·65 cites·24 claims
- 0573US5384009APlasma etching using xenonAPPLIED MATERIALS INC·Filed 1993·Granted Jan 24, 1995·57 cites·26 claims
- 0669US5685916ADry cleaning of semiconductor processing chambersAPPLIED MATERIALS INC·Filed 1995·Granted Nov 11, 1997·27 cites·8 claims
- 0768US5387556AEtching aluminum and its alloys using HC1, C1-containing etchant and N.sub.2APPLIED MATERIALS INC·Filed 1993·Granted Feb 7, 1995·49 cites·48 claims
- 0867US5676759APlasma dry cleaning of semiconductor processing chambersAPPLIED MATERIALS INC·Filed 1995·Granted Oct 14, 1997·25 cites·10 claims
- 0964US5423918AMethod for reducing particulate contamination during plasma processing of semiconductor devicesAPPLIED MATERIALS INC·Filed 1993·Granted Jun 13, 1995·37 cites·12 claims
- 1054US5753137ADry cleaning of semiconductor processing chambers using non-metallic, carbon-comprising materialAPPLIED MATERIALS INC·Filed 1997·Granted May 19, 1998·13 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →