Inventor · disambiguated record
Chie Shishido
Also filed as: SHISHIDO CHIE
82 granted patents·9 pending applications·1,559 citations·filing 1997–2017
99Inventor score
Top patents by PatentIndex Score
91 records- 0194US7274813B2Defect inspection method and apparatusHITACHI LTD·Filed 2005·Granted Sep 25, 2007·18 cites·24 claims
- 0293US8107717B2Defect inspection method and apparatusMAEDA SHUNJI·Filed 2011·Granted Jan 31, 2012·14 cites·16 claims
- 0393US7633061B2Method and apparatus for measuring pattern dimensionsHITACHI HIGH TECH CORP·Filed 2008·Granted Dec 15, 2009·25 cites·14 claims
- 0492US6865288B1Pattern inspection method and apparatusHITACHI LTD·Filed 2000·Granted Mar 8, 2005·75 cites·20 claims
- 0592US6587581B1Visual inspection method and apparatus thereforHITACHI LTD·Filed 1998·Granted Jul 1, 2003·118 cites·59 claims
- 0691US7732761B2Method for measuring a pattern dimension using a scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2007·Granted Jun 8, 2010·18 cites·13 claims
- 0791US7269287B2Method and apparatus for measuring dimension using electron microscopeHITACHI HIGH TECH CORP·Filed 2006·Granted Sep 11, 2007·23 cites·6 claims
- 0891US6947587B1Defect inspection method and apparatusHITACHI LTD·Filed 1999·Granted Sep 20, 2005·88 cites·30 claims
- 0991US6909930B2Method and system for monitoring a semiconductor device manufacturing processHITACHI LTD·Filed 2002·Granted Jun 21, 2005·52 cites·37 claims
- 1090US8110800B2Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the systemSHISHIDO CHIE·Filed 2009·Granted Feb 7, 2012·10 cites·20 claims
- 1190US7807980B2Charged particle beam apparatus and methods for capturing images using the sameHITACHI HIGH TECH CORP·Filed 2006·Granted Oct 5, 2010·11 cites·7 claims
- 1290US7476857B2Tool-to-tool matching control method and its system for scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2006·Granted Jan 13, 2009·10 cites·28 claims
- 1390US7408155B2Measuring method and its apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Aug 5, 2008·16 cites·10 claims
- 1490US6674890B2Defect inspection method and apparatus thereforHITACHI LTD·Filed 2000·Granted Jan 6, 2004·41 cites·10 claims
- 1590US6169282B1Defect inspection method and apparatus thereforHITACHI LTD·Filed 1998·Granted Jan 2, 2001·107 cites·32 claims
- 1689US9852881B2Scanning electron microscope system, pattern measurement method using same, and scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2014·Granted Dec 26, 2017·9 cites·25 claims
- 1789US8003940B2Tool-to-tool matching control method and its system for scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2009·Granted Aug 23, 2011·9 cites·7 claims
- 1889US7408154B2Scanning electron microscope, method for measuring a dimension of a pattern using the same, and apparatus for correcting difference between scanning electron microscopesHITACHI HIGH TECH CORP·Filed 2005·Granted Aug 5, 2008·12 cites·13 claims
- 1989US6476388B1Scanning electron microscope having magnification switching controlHITACHI LTD·Filed 1999·Granted Nov 5, 2002·95 cites·9 claims
- 2088US8331651B2Method and apparatus for inspecting defect of pattern formed on semiconductor deviceNISHIURA TOMOFUMI·Filed 2011·Granted Dec 11, 2012·11 cites·16 claims
- 2188US6841403B2Method for manufacturing semiconductor devices and method and its apparatus for processing detected defect dataHITACHI LTD·Filed 2003·Granted Jan 11, 2005·35 cites·17 claims
- 2288US6614923B1Pattern inspecting method and apparatus thereof, and pattern inspecting method on basis of electron beam images and apparatus thereofHITACHI LTD·Filed 1999·Granted Sep 2, 2003·49 cites·30 claims
- 2387US7399964B2Electron microscope, measuring method using the same, electron microscope system, and method for controlling the systemHITACHI HIGH TECH CORP·Filed 2005·Granted Jul 15, 2008·11 cites·10 claims
- 2486US10186399B2Scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2017·Granted Jan 22, 2019·4 cites·10 claims
- 2586US8481936B2Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the systemSHISHIDO CHIE·Filed 2012·Granted Jul 9, 2013·4 cites·16 claims
- 2686US7230243B2Method and apparatus for measuring three-dimensional shape of specimen by using SEMHITACHI HIGH TECH CORP·Filed 2005·Granted Jun 12, 2007·9 cites·15 claims
- 2786US7133550B2Pattern inspection method and apparatusHITACHI LTD·Filed 2001·Granted Nov 7, 2006·19 cites·15 claims
- 2886US6898305B2Circuit pattern inspection method and apparatusHITACHI LTD·Filed 2001·Granted May 24, 2005·40 cites·24 claims
- 2986US6087673AMethod of inspecting pattern and apparatus thereofHITACHI LTD·Filed 1998·Granted Jul 11, 2000·58 cites·29 claims
- 3085US7116816B2Method of inspecting a pattern and an apparatus thereof and a method of processing a specimenHITACHI LTD·Filed 2001·Granted Oct 3, 2006·41 cites·23 claims
- 3185US6913861B2Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor deviceHITACHI HIGH TECH CORP·Filed 2003·Granted Jul 5, 2005·24 cites·18 claims
- 3284US9188554B2Pattern inspection device and pattern inspection methodHITACHI HIGH TECH CORP·Filed 2013·Granted Nov 17, 2015·6 cites·18 claims
- 3384US7439504B2Pattern inspection method and apparatus using electron beamHITACHI LTD·Filed 2005·Granted Oct 21, 2008·6 cites·4 claims
- 3484US6929892B2Method of monitoring an exposure processHITACHI HIGH TECH CORP·Filed 2004·Granted Aug 16, 2005·25 cites·15 claims
- 3583US7957579B2Pattern inspection method and apparatusHITACHI LTD·Filed 2007·Granted Jun 7, 2011·5 cites·11 claims
- 3683US7894658B2Pattern inspection method and apparatusHITACHI LTD·Filed 2007·Granted Feb 22, 2011·4 cites·17 claims
- 3783US7460714B2Method and apparatus for measuring dimension using electron microscopeHITACHI HIGH TECH CORP·Filed 2007·Granted Dec 2, 2008·10 cites·15 claims
- 3883US7166839B2Apparatus for measuring a three-dimensional shapeHITACHI HIGH TECH CORP·Filed 2005·Granted Jan 23, 2007·7 cites·6 claims
- 3982US7512259B2Defect inspection method and apparatusHITACHI LTD·Filed 2007·Granted Mar 31, 2009·7 cites·4 claims
- 4082US6797526B2Method for manufacturing semiconductor devices and method and its apparatus for processing detected defect dataHITACHI LTD·Filed 2002·Granted Sep 28, 2004·23 cites·12 claims
- 4181US6236057B1Method of inspecting pattern and apparatus thereof with a differential brightness image detectionHITACHI LTD·Filed 2000·Granted May 22, 2001·15 cites·23 claims
- 4280US7266235B2Pattern inspection method and apparatusHITACHI LTD·Filed 2001·Granted Sep 4, 2007·10 cites·13 claims
- 4380US6614022B2Pattern inspection method and apparatus using electron beamHITACHI LTD·Filed 2001·Granted Sep 2, 2003·11 cites·28 claims
- 4479US7269280B2Method and its apparatus for inspecting a patternHITACHI LTD·Filed 2002·Granted Sep 11, 2007·22 cites·26 claims
- 4579US7164127B2Scanning electron microscope and a method for evaluating accuracy of repeated measurement using the sameHITACHI HIGH TECH CORP·Filed 2004·Granted Jan 16, 2007·16 cites·17 claims
- 4678US9671223B2Pattern dimension measurement method using electron microscope, pattern dimension measurement system, and method for monitoring changes in electron microscope equipment over timeSHISHIDO CHIE·Filed 2011·Granted Jun 6, 2017·4 cites·8 claims
- 4778US9019362B2Charged particle beam device and a method of improving image quality of the sameBAI JIE·Filed 2010·Granted Apr 28, 2015·4 cites·14 claims
- 4878US7916929B2Defect inspection method and apparatusHITACHI LTD·Filed 2009·Granted Mar 29, 2011·5 cites·16 claims
- 4978US7685560B2Method and apparatus for monitoring exposure processHITACHI HIGH TECH CORP·Filed 2004·Granted Mar 23, 2010·16 cites·14 claims
- 5077US7335881B2Method of measuring dimensions of patternHITACHI HIGH TECH CORP·Filed 2004·Granted Feb 26, 2008·13 cites·18 claims
Showing the top 50 of 91 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →