Inventor · disambiguated record
Cheng-Tzung Tsai
Also filed as: TSAI CHENG-TZUNG
16 granted patents·7 pending applications·79 citations·filing 2000–2024
90Inventor score
Top patents by PatentIndex Score
23 records- 0193US8466502B2Metal-gate CMOS deviceTSAI SHIH-HUNG·Filed 2011·Granted Jun 18, 2013·17 cites·8 claims
- 0292US10068963B2Fin-type field effect transistor and method of forming the sameUNITED MICROELECTRONICS CORP·Filed 2015·Granted Sep 4, 2018·7 cites·9 claims
- 0389US8207523B2Metal oxide semiconductor field effect transistor with strained source/drain extension layerTSAI CHEN-HUA·Filed 2006·Granted Jun 26, 2012·28 cites·21 claims
- 0485US8592271B2Metal-gate CMOS device and fabrication method thereofUNITED MICROELECTRONICS CORP·Filed 2013·Granted Nov 26, 2013·7 cites·10 claims
- 0578US8058133B2Method of fabrication of metal oxide semiconductor field effect transistorTSAI CHEN-HUA·Filed 2008·Granted Nov 15, 2011·12 cites·17 claims
- 0671US7935590B2Method of manufacturing metal oxide semiconductor and complementary metal oxide semiconductorUNITED MICROELECTRONICS CORP·Filed 2006·Granted May 3, 2011·5 cites·11 claims
- 0762US2025380407A1Programmable device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2024·Application pending·0 cites
- 0859US2025357119A1Semiconductor stitching structure and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2024·Application pending·0 cites
- 0958US10439023B2Fin-type field effect transistor and method of forming the sameUNITED MICROELECTRONICS CORP·Filed 2018·Granted Oct 8, 2019·0 cites·12 claims
- 1058US2025233038A1Semiconductor structure and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2024·Application pending·0 cites
- 1156US10177231B2Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2017·Granted Jan 8, 2019·0 cites·9 claims
- 1256US7714396B2Metal-oxide semiconductor field effect transistorUNITED MICROELECTRONICS CORP·Filed 2006·Granted May 11, 2010·1 cites·6 claims
- 1352US9837493B2Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2015·Granted Dec 5, 2017·0 cites·7 claims
- 1449US2024304657A1Semiconductor device and method for fabricating the sameUNITED MICROELECTRONICS CORP·Filed 2023·Application pending·0 cites
- 1545US2009068824A1Fabricating method of semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 1644US8080454B2Method of fabricating CMOS transistorCHIANG WEN-TAI·Filed 2009·Granted Dec 20, 2011·0 cites·18 claims
- 1743US6248178B1Method for removing pad nodulesUNITED MICROELECTRONICS CORP·Filed 2000·Granted Jun 19, 2001·2 cites·9 claims
- 1842US8440514B2Semiconductor device and method for manufacturing the sameLIU PO-WEI·Filed 2008·Granted May 14, 2013·0 cites·7 claims
- 1941US9590041B1Semiconductor structureUNITED MICROELECTRONICS CORP·Filed 2015·Granted Mar 7, 2017·0 cites·8 claims
- 2041US2012199849A1Method of fabrication of metal oxide semiconductor field effect transistorTSAI CHEN-HUA·Filed 2012·Application pending·0 cites
- 2139US2012264297A1Method for creating via in ic manufacturing processCHANG CHUNG-FU·Filed 2011·Application pending·0 cites
- 2238US10573649B2Semiconductor device and manufacturing method thereofUNITED MICROELECTRONICS CORP·Filed 2016·Granted Feb 25, 2020·0 cites·9 claims
- 2337US8273642B2Method of fabricating an NMOS transistorTSAI CHEN-HUA·Filed 2010·Granted Sep 25, 2012·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →