Inventor · disambiguated record
Che-Hao Tu
Also filed as: TU CHE-HAO
15 granted patents·5 pending applications·25 citations·filing 2011–2025
88Inventor score
Top patents by PatentIndex Score
20 records- 0193US11854821B2Hard mask removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 26, 2023·2 cites·20 claims
- 0291US10971370B2Hard mask removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 6, 2021·4 cites·20 claims
- 0390US10510552B2Hard mask removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 17, 2019·4 cites·20 claims
- 0486US9960050B2Hard mask removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted May 1, 2018·5 cites·20 claims
- 0578US2025357100A1Processing tool and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0676US2024367202A1Electrical cleaning tool for wafer polishing tool systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0774US8598028B2Gate height loss improvement for a transistorTU CHE-HAO·Filed 2011·Granted Dec 3, 2013·5 cites·15 claims
- 0873US8975179B2Planarization process for semiconductor device fabricationTU CHE-HAO·Filed 2011·Granted Mar 10, 2015·5 cites·16 claims
- 0972US2024217052A1Zone-based cmp target controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1071US12128455B2Electrical cleaning tool for wafer polishing tool systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 29, 2024·0 cites·20 claims
- 1160US12068196B2Forming gate line-end of semiconductor structures with improved metal gate heightTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 20, 2024·0 cites·20 claims
- 1260US11951587B2Zone-based CMP target controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 9, 2024·0 cites·20 claims
- 1357US10800004B2System and method of chemical mechanical polishingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 13, 2020·0 cites·20 claims
- 1457US2021023678A1System and Method of Chemical Mechanical PolishingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Application pending·0 cites
- 1557US2025038008A1Methods for chemical mechanical polishing and methods for forming an interconnect structure of a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1649US10943822B2Forming gate line-end of semiconductor structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Mar 9, 2021·0 cites·20 claims
- 1744US9941109B2Surface treatment in a chemical mechanical processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Apr 10, 2018·0 cites·20 claims
- 1843US9711374B2Mechanisms for forming oxide layer over exposed polysilicon during a chemical mechanical polishing (CMP) processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Jul 18, 2017·0 cites·20 claims
- 1943US9595450B2Composite structure for gate level inter-layer dielectricTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Mar 14, 2017·0 cites·19 claims
- 2042US9922837B2Asymmetric application of pressure to a wafer during a CMP processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Mar 20, 2018·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →