Inventor · disambiguated record
Charles H. Winter
Also filed as: WINTER CHARLES · WINTER CHARLES H · WINTER CHARLES HARTGER · WINTER JR CHARLES H
43 granted patents·14 pending applications·368 citations·filing 1986–2024
97Inventor score
Top patents by PatentIndex Score
57 records- 0196US9255327B2Thermally stable volatile precursorsWINTER CHARLES H·Filed 2011·Granted Feb 9, 2016·41 cites·18 claims
- 0293US9540730B2Deposition of metal films based upon complementary reactionsUNIV WAYNE STATE·Filed 2013·Granted Jan 10, 2017·7 cites·32 claims
- 0392US6887297B2Copper nanocrystals and methods of producing sameUNIV WAYNE STATE·Filed 2002·Granted May 3, 2005·83 cites·13 claims
- 0490US11505562B2Process for the generation of metal-containing filmsBASF SE·Filed 2018·Granted Nov 22, 2022·4 cites·7 claims
- 0590US9822446B2Thermally stable volatile precursorsUNIV WAYNE STATE·Filed 2016·Granted Nov 21, 2017·3 cites·5 claims
- 0689US9982344B2Thermally stable volatile precursorsUNIV WAYNE STATE·Filed 2016·Granted May 29, 2018·3 cites·10 claims
- 0788US9157149B2Bis(trimethylsilyl) six-membered ring systems and related compounds as reducing agents for forming layers on a substrateUNIV WAYNE STATE·Filed 2013·Granted Oct 13, 2015·6 cites·26 claims
- 0887US11319332B2Process for the generation of metal-containing filmsBASF SE·Filed 2018·Granted May 3, 2022·2 cites·13 claims
- 0987US8148564B2Compounds for forming metal nitridesWINTER CHARLES H·Filed 2007·Granted Apr 3, 2012·8 cites·15 claims
- 1080US5425966AProcess for coating with single source precursorsUNIV WAYNE STATE·Filed 1994·Granted Jun 20, 1995·65 cites·13 claims
- 1179US6897151B2Methods of filling a feature on a substrate with copper nanocrystalsUNIV WAYNE STATE·Filed 2002·Granted May 24, 2005·24 cites·46 claims
- 1278US11655262B2Process for the generation of metal-containing filmsBASF SE·Filed 2022·Granted May 23, 2023·0 cites·1 claims
- 1378US8907115B2Synthesis and characterization of first row transition metal complexes containing α-keto hydrazonate ligands as potential precursors for use in metal film depositionUNIV WAYNE STATE·Filed 2012·Granted Dec 9, 2014·1 cites·23 claims
- 1473US8962876B2Thermally stable volatile film precursorsWINTER CHARLES H·Filed 2010·Granted Feb 24, 2015·2 cites·12 claims
- 1572US2018265975A1Thermally stable volatile precursorsUNIV WAYNE STATE·Filed 2018·Application pending·0 cites
- 1670US12435411B2Metal organonitrile precursors for thin film depositionAPPLIED MATERIALS INC·Filed 2023·Granted Oct 7, 2025·0 cites·20 claims
- 1769US5591483AProcess for the preparation of metal nitride coatings from single source precursorsUNIV WAYNE STATE·Filed 1994·Granted Jan 7, 1997·25 cites·24 claims
- 1868US2024347502A1Methods of forming stacked integrated circuits using selective thermal atomic layer deposition on conductive contacts and structures formed using the sameUNIV CALIFORNIA·Filed 2024·Application pending·0 cites
- 1965US9249505B2Bis(trimethylsilyl) six-membered ring systems and related compounds as reducing agents for forming layers on a substrateUNIV WAYNE STATE·Filed 2014·Granted Feb 2, 2016·2 cites·30 claims
- 2064US9758866B2Synthesis and characterization of first row transition metal complexes containing α-imino alkoxides as precursors for deposition of metal filmsUNIV WAYNE STATE·Filed 2013·Granted Sep 12, 2017·0 cites·18 claims
- 2163US12027488B2Methods of forming stacked integrated circuits using selective thermal atomic layer deposition on conductive contacts and structures formed using the sameUNIV CALIFORNIA·Filed 2021·Granted Jul 2, 2024·0 cites·20 claims
- 2263US7901656B2Metal oxide-containing nanoparticlesUNIV WAYNE STATE·Filed 2004·Granted Mar 8, 2011·8 cites·11 claims
- 2361US2025283212A1Inherently selective thermal atomic layer deposition of copper metal filmsUNIV WAYNE STATE·Filed 2024·Application pending·0 cites
- 2460US2013330473A1Atomic Layer Deposition of Transition Metal Thin Films Using Boranes as the Reducing AgentWINTER CHARLES H·Filed 2012·Application pending·0 cites
- 2559US9714464B2Precursors for atomic layer depositionUNIV WAYNE STATE·Filed 2013·Granted Jul 25, 2017·0 cites·26 claims
- 2659US7578953B2Method of sulfonating an article and related apparatusSULFO TECHNOLOGIES LLC·Filed 2007·Granted Aug 25, 2009·1 cites·3 claims
- 2759US5409735AChemical vapor deposition of metal pnictogenide films using single source precursorsUNIV WAYNE STATE·Filed 1994·Granted Apr 25, 1995·20 cites·17 claims
- 2858US2024271277A1Atomic layer deposition of group fifteen materialsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2957US12297534B2Process for the generation of metal- or semimetal-containing filmsBASF SE·Filed 2020·Granted May 13, 2025·0 cites·11 claims
- 3057US2015167158A1Atomic Layer Deposition of Transition Metal Thin Films Using Boranes as the Reducing AgentUNIV WAYNE STATE·Filed 2015·Application pending·0 cites
- 3157US2009246368A1Method of sulfonating an article and related apparatusWINTER CHARLES H·Filed 2009·Application pending·0 cites
- 3257US2023235451A1Molybdenum-dad precursors for deposition of molybdenum filmsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3356US11377454B2Aluminum precursor and process for the generation of metal-containing filmsBASF SE·Filed 2019·Granted Jul 5, 2022·0 cites·14 claims
- 3454US12492475B2Process for the generation of metal- or semimetal-containing filmsBASF SE·Filed 2020·Granted Dec 9, 2025·0 cites·13 claims
- 3554US10711346B26-membered cyclic dienes as strongly reducing precursors for the growth of element films by vapor phase depositionUNIV WAYNE STATE·Filed 2016·Granted Jul 14, 2020·0 cites·17 claims
- 3652US12084464B2Rhenium complexes and methods of useAPPLIED MATERIALS INC·Filed 2020·Granted Sep 10, 2024·0 cites·16 claims
- 3752US11532474B2Deposition of rhenium-containing thin filmsAPPLIED MATERIALS INC·Filed 2020·Granted Dec 20, 2022·0 cites·19 claims
- 3851US2014234550A1Atomic layer deposition of transition metal thin filmsWINTER CHARLES H·Filed 2012·Application pending·0 cites
- 3950US11408068B2Deposition of tellurium-containing thin filmsAPPLIED MATERIALS INC·Filed 2021·Granted Aug 9, 2022·0 cites·15 claims
- 4050US5194642AMetallo-organic precursors to titanium nitrideFORD MOTOR CO·Filed 1992·Granted Mar 16, 1993·12 cites·13 claims
- 4149US5900498AProcess for the preparation of metal nitride coatings from single source precursors and precursors suitable thereforUNIV WAYNE STATE·Filed 1996·Granted May 4, 1999·12 cites·9 claims
- 4249US2022298638A1Process for the generation of metal- or semimetal-containing filmsBASF SE·Filed 2020·Application pending·0 cites
- 4347US2005277297A1Copper nanocrystals and methods of producing sameWINTER CHARLES H·Filed 2005·Application pending·0 cites
- 4447US2022298635A1Thermal ald of metal thin filmsUNIV WAYNE STATE·Filed 2021·Application pending·0 cites
- 4546US10533023B2Bis(trimethylsilyl) six-membered ring systems and related compounds as reducing agents for forming layers on a substrateUNIV WAYNE STATE·Filed 2016·Granted Jan 14, 2020·0 cites·11 claims
- 4644US4699987A(Perfluoroalkyl)-cyclopentadienylthalliumUNIV MINNESOTA·Filed 1986·Granted Oct 13, 1987·2 cites·2 claims
- 4744US2022025514A1Precursors And Processes For The Thermal ALD Of Cobalt Metal Thin FilmsUNIV WAYNE STATE·Filed 2020·Application pending·0 cites
- 4843US11015241B2Reaction of diazadiene complexes with aminesUNIV WAYNE STATE·Filed 2017·Granted May 25, 2021·0 cites·32 claims
- 4943US10982336B2Method for etching a metal surfaceUNIV WAYNE STATE·Filed 2017·Granted Apr 20, 2021·0 cites·31 claims
- 5043US5112650AChemical vapor deposition of metal chalcogenide filmsUNIV WAYNE STATE·Filed 1991·Granted May 12, 1992·10 cites·16 claims
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