Inventor · disambiguated record
Chenghao Wu
Also filed as: WU CHENGHAO
4 granted patents·22 pending applications·14 citations·filing 2019–2025
69Inventor score
Top patents by PatentIndex Score
26 records- 0191US12211691B2Dry development of resistsLAM RES CORP·Filed 2019·Granted Jan 28, 2025·8 cites·12 claims
- 0288US12436464B2Pre-exposure photoresist curing to enhance EUV lithographic performanceLAM RES CORP·Filed 2021·Granted Oct 7, 2025·2 cites·25 claims
- 0388US11921427B2Methods for making hard masks useful in next-generation lithographyLAM RES CORP·Filed 2019·Granted Mar 5, 2024·4 cites·42 claims
- 0472US2025112045A1Dry development of resistsLAM RES CORP·Filed 2024·Application pending·0 cites
- 0569US2025291253A1Apparatus for photoresist dry depositionLAM RES CORP·Filed 2025·Application pending·0 cites
- 0669US2025244672A1Bake strategies to enhance lithographic performance of metal-containing resistLAM RES CORP·Filed 2025·Application pending·0 cites
- 0767US2025271766A1Metal chelators for development of metal-containing photoresistLAM RES CORP·Filed 2025·Application pending·0 cites
- 0867US2025250485A1Photoresist development with organic vaporLAM RES CORP·Filed 2025·Application pending·0 cites
- 0965US2025201553A1Methods for making euv patternable hard masksLAM RES CORP·Filed 2025·Application pending·0 cites
- 1059US2025346767A1Tin precursors for deposition of euv dry resistLAM RES CORP·Filed 2023·Application pending·0 cites
- 1156US2022308462A1Apparatus for photoresist dry depositionLAM RES CORP·Filed 2020·Application pending·0 cites
- 1255US2023266670A1Metal chelators for development of metal-containing photoresistLAM RES CORP·Filed 2021·Application pending·0 cites
- 1354US2025217256A1User behavior recognition method and apparatus based on screen recording data, and readable storage mediumGHAWAR DIGITAL CO LTD·Filed 2024·Application pending·0 cites
- 1453US2025053084A1Development of hybrid organotin oxide photoresistsLAM RES CORP·Filed 2022·Application pending·0 cites
- 1552US2023314946A1Method of forming photo-sensitive hybrid filmsLAM RES CORP·Filed 2021·Application pending·0 cites
- 1652US2025053092A1Aqueous acid development or treatment of organometallic photoresistLAM RES CORP·Filed 2022·Application pending·0 cites
- 1750US2021013034A1Methods for making euv patternable hard masksLAM RES CORP·Filed 2019·Application pending·0 cites
- 1849US2024231224A9Halogen-and aliphatic-containing organotin photoresists and methods thereofLAM RES CORP·Filed 2022·Application pending·0 cites
- 1947US2025060673A1Development strategy for high-absorbing metal-containing photoresistsLAM RES CORP·Filed 2022·Application pending·0 cites
- 2047US2022365434A1Substrate surface modification with high euv absorbers for high performance euv photoresistsLAM RES CORP·Filed 2020·Application pending·0 cites
- 2144US2022344136A1Dry chamber clean of photoresist filmsLAM RES CORP·Filed 2020·Application pending·0 cites
- 2244US2022299877A1Positive tone development of cvd euv resist filmsLAM RES CORP·Filed 2020·Application pending·0 cites
- 2344US2023259025A1Dry deposited photoresists with organic co-reactantsLAM RES CORP·Filed 2021·Application pending·0 cites
- 2441US2023266664A1Photoresists from sn(ii) precursorsLAM RES CORP·Filed 2021·Application pending·0 cites
- 2541US2023288798A1Photoresists containing tantalumLAM RES CORP·Filed 2021·Application pending·0 cites
- 2626US11483621B2Big data acquisition and analysis system using intelligent image recognition, and application method thereofSHANGHAI ILLUMINERA DIGITAL TECH CO LTD·Filed 2020·Granted Oct 25, 2022·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →