Inventor · disambiguated record
Costel Biloiu
Also filed as: BILOIU COSTEL
47 granted patents·9 pending applications·177 citations·filing 2007–2025
97Inventor score
Files withAPPLIED MATERIALS INC24VARIAN SEMICONDUCTOR EQUIPMENT ASS INC16VARIAN SEMICONDUCTOR EQUIPMENT10BILOIU COSTEL4KURUNCZI PETER1
Top patents by PatentIndex Score
56 records- 0197US11596051B2Resonator, linear accelerator configuration and ion implantation system having toroidal resonatorAPPLIED MATERIALS INC·Filed 2020·Granted Feb 28, 2023·4 cites·18 claims
- 0296US11812539B2Resonator, linear accelerator configuration and ion implantation system having rotating exciterAPPLIED MATERIALS INC·Filed 2021·Granted Nov 7, 2023·4 cites·19 claims
- 0394US10468226B1Extraction apparatus and system for high throughput ion beam processingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Nov 5, 2019·15 cites·19 claims
- 0494US9706634B2Apparatus and techniques to treat substrates using directional plasma and reactive gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jul 11, 2017·12 cites·14 claims
- 0592US10192727B2Electrodynamic mass analysisVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jan 29, 2019·8 cites·19 claims
- 0692US8436318B2Apparatus for controlling the temperature of an RF ion source windowSINCLAIR FRANK·Filed 2010·Granted May 7, 2013·16 cites·18 claims
- 0791US11270864B2Apparatus and system including extraction optics having movable blockersAPPLIED MATERIALS INC·Filed 2020·Granted Mar 8, 2022·3 cites·19 claims
- 0889US10004133B2Apparatus and techniques to treat substrates using directional plasma and reactive gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jun 19, 2018·5 cites·18 claims
- 0989US8590485B2Small form factor plasma source for high density wide ribbon ion beam generationBILOIU COSTEL·Filed 2010·Granted Nov 26, 2013·11 cites·20 claims
- 1088US11094504B2Resonator coil having an asymmetrical profileAPPLIED MATERIALS INC·Filed 2020·Granted Aug 17, 2021·2 cites·19 claims
- 1188US9514912B2Control of ion angular distribution of ion beams with hidden deflection electrodeVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Dec 6, 2016·9 cites·20 claims
- 1287US11127556B2Extraction apparatus and system for high throughput ion beam processingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2019·Granted Sep 21, 2021·3 cites·17 claims
- 1387US9396902B2Gallium ION source and materials thereforeBILOIU COSTEL·Filed 2012·Granted Jul 19, 2016·9 cites·10 claims
- 1486US11056319B2Apparatus and system having extraction assembly for wide angle ion beamAPPLIED MATERIALS INC·Filed 2019·Granted Jul 6, 2021·5 cites·17 claims
- 1586US9293301B2In situ control of ion angular distribution in a processing apparatusVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Mar 22, 2016·7 cites·15 claims
- 1686US2025364223A1Ion extraction optics having non uniform grid assemblyAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1785US10665433B2Extreme edge uniformity controlVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted May 26, 2020·3 cites·16 claims
- 1884US7888662B2Ion source cleaning method and apparatusVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Feb 15, 2011·9 cites·20 claims
- 1983US7812321B2Techniques for providing a multimode ion sourceVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Oct 12, 2010·9 cites·12 claims
- 2082US9060411B2Hardware plasma interlock systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Jun 16, 2015·12 cites·19 claims
- 2182US7999479B2Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2009·Granted Aug 16, 2011·6 cites·17 claims
- 2281US12406833B2Ion extraction optics having non uniform grid assemblyAPPLIED MATERIALS INC·Filed 2023·Granted Sep 2, 2025·0 cites·12 claims
- 2381US10763072B1Apparatus, system and techniques for mass analyzed ion beamAPPLIED MATERIALS INC·Filed 2019·Granted Sep 1, 2020·2 cites·19 claims
- 2481US10224181B2Radio frequency extraction system for charge neutralized ion beamVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Mar 5, 2019·3 cites·13 claims
- 2579US12144101B2Resonator, linear accelerator configuration and ion implantation system having rotating exciterAPPLIED MATERIALS INC·Filed 2023·Granted Nov 12, 2024·0 cites·20 claims
- 2679US8142607B2High density helicon plasma source for wide ribbon ion beam generationBILOIU COSTEL·Filed 2008·Granted Mar 27, 2012·7 cites·11 claims
- 2778US9620335B2In situ control of ion angular distribution in a processing apparatusVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Apr 11, 2017·2 cites·14 claims
- 2875US12400824B2Ion extraction optics having novel blocker configurationAPPLIED MATERIALS INC·Filed 2022·Granted Aug 26, 2025·0 cites·20 claims
- 2974US11710617B2Resonator coil having an asymmetrical profileAPPLIED MATERIALS INC·Filed 2021·Granted Jul 25, 2023·0 cites·19 claims
- 3072US8809803B2Inductively coupled plasma ion source with multiple antennas for wide ion beamVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Aug 19, 2014·2 cites·20 claims
- 3171US11226439B2System and method for forming surface relief gratingsAPPLIED MATERIALS INC·Filed 2018·Granted Jan 18, 2022·1 cites·11 claims
- 3270US7652270B2Techniques for ion beam current measurement using a scanning beam current transformerVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Jan 26, 2010·2 cites·16 claims
- 3369US8659229B2Plasma attenuation for uniformity controlKURUNCZI PETER·Filed 2011·Granted Feb 25, 2014·3 cites·18 claims
- 3467US10128082B2Apparatus and techniques to treat substrates using directional plasma and point of use chemistryVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Nov 13, 2018·1 cites·11 claims
- 3566US11574800B2Extreme edge uniformity controlVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2020·Granted Feb 7, 2023·0 cites·6 claims
- 3665US9299536B2Wide metal-free plasma flood gunVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Mar 29, 2016·1 cites·17 claims
- 3765US9187832B2Extended lifetime ion sourceVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Nov 17, 2015·1 cites·19 claims
- 3861US11948781B2Apparatus and system including high angle extraction opticsAPPLIED MATERIALS INC·Filed 2021·Granted Apr 2, 2024·0 cites·20 claims
- 3961US11495430B2Tunable extraction assembly for wide angle ion beamAPPLIED MATERIALS INC·Filed 2020·Granted Nov 8, 2022·0 cites·13 claims
- 4061US11361935B2Apparatus and system including high angle extraction opticsAPPLIED MATERIALS INC·Filed 2020·Granted Jun 14, 2022·0 cites·20 claims
- 4161US2025232942A1Ion extraction optics for ion processing systemAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4260US10600616B2Apparatus and techniques to treat substrates using directional plasma and point of use chemistryVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Mar 24, 2020·0 cites·15 claims
- 4360US2025246414A1Systems and methods for high-throughput angled ion processingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4459US2025343023A1Resonator, linear accelerator configuration and ion implantation system having tapered resonatorAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4559US2025285843A1Systems and methods for high-throughput angled ion processingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 4658US2025157833A1Cold plate for trapping etching and deposition byproductsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4753US2025022697A1Plasma system having residence time tuning assemblyAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4852US12191117B2Compact low angle ion beam extraction assembly and processing apparatusAPPLIED MATERIALS INC·Filed 2021·Granted Jan 7, 2025·0 cites·16 claims
- 4952US11818830B2RF quadrupole particle acceleratorAPPLIED MATERIALS INC·Filed 2021·Granted Nov 14, 2023·0 cites·16 claims
- 5051US10049861B2Inductively coupled RF plasma source with magnetic confinement and Faraday shieldingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Aug 14, 2018·0 cites·15 claims
Showing the top 50 of 56 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →