Inventor · disambiguated record
Cuc K. Huynh
Also filed as: HUYNH CUC · HUYNH CUC K · HUYNH CUC KIM
27 granted patents·2 pending applications·795 citations·filing 1996–2007
97Inventor score
Top patents by PatentIndex Score
29 records- 0189US6190237B1pH-buffered slurry and use thereof for polishingIBM·Filed 1997·Granted Feb 20, 2001·107 cites·19 claims
- 0288US5704987AProcess for removing residue from a semiconductor wafer after chemical-mechanical polishingIBM·Filed 1996·Granted Jan 6, 1998·104 cites·9 claims
- 0387US5778481ASilicon wafer cleaning and polishing padsIBM·Filed 1996·Granted Jul 14, 1998·102 cites·6 claims
- 0483US5896870AMethod of removing slurry particlesIBM·Filed 1997·Granted Apr 27, 1999·55 cites·27 claims
- 0582US6352596B2Post CMP cleaning method using a brush cleaner with torque monitorIBM·Filed 2001·Granted Mar 5, 2002·27 cites·18 claims
- 0682US5981148AMethod for forming sidewall spacers using frequency doubling hybrid resist and device formed therebyIBM·Filed 1997·Granted Nov 9, 1999·49 cites·27 claims
- 0780US6432823B1Off-concentric polishing system designIBM·Filed 1999·Granted Aug 13, 2002·42 cites·5 claims
- 0877US6179693B1In-situ/self-propelled polishing pad conditioner and cleanerIBM·Filed 1998·Granted Jan 30, 2001·44 cites·21 claims
- 0975US6300246B1Method for chemical mechanical polishing of semiconductor waferIBM·Filed 2000·Granted Oct 9, 2001·18 cites·14 claims
- 1073US5976768AMethod for forming sidewall spacers using frequency doubling hybrid resist and device formed therebyIBM·Filed 1998·Granted Nov 2, 1999·31 cites·7 claims
- 1170US6599173B1Method to prevent leaving residual metal in CMP process of metal interconnectIBM·Filed 2000·Granted Jul 29, 2003·14 cites·22 claims
- 1269US6135865ACMP apparatus with built-in slurry distribution and removalIBM·Filed 1998·Granted Oct 24, 2000·27 cites·6 claims
- 1368US6269510B1Post CMP clean brush with torque monitorIBM·Filed 1999·Granted Aug 7, 2001·31 cites·17 claims
- 1467US8301288B2Optimized scheduling based on sensitivity dataDENTON BRIAN T·Filed 2004·Granted Oct 30, 2012·3 cites·34 claims
- 1566US7754394B2Method to etch chrome for photomask fabricationIBM·Filed 2006·Granted Jul 13, 2010·2 cites·12 claims
- 1666US6299515B1CMP apparatus with built-in slurry distribution and removalIBM·Filed 2000·Granted Oct 9, 2001·10 cites·6 claims
- 1763US7014959B2CD uniformity of chrome etch to photomask processIBM·Filed 2003·Granted Mar 21, 2006·8 cites·27 claims
- 1862US6468135B1Method and apparatus for multiphase chemical mechanical polishingIBM·Filed 1999·Granted Oct 22, 2002·23 cites·16 claims
- 1960US6287178B1Wafer carrier rinsing mechanismIBM·Filed 1999·Granted Sep 11, 2001·22 cites·10 claims
- 2057US7304000B2Photoresist trimming processIBM·Filed 2004·Granted Dec 4, 2007·5 cites·10 claims
- 2155US6171436B1Apparatus for removing slurry particlesIBM·Filed 1998·Granted Jan 9, 2001·16 cites·30 claims
- 2254US5834642ADownstream monitor for CMP brush cleanersIBM·Filed 1997·Granted Nov 10, 1998·17 cites·7 claims
- 2352US7960288B2Photoresist trimming processIBM·Filed 2007·Granted Jun 14, 2011·0 cites·7 claims
- 2452US7955988B2Photoresist trimming processIBM·Filed 2007·Granted Jun 7, 2011·0 cites·4 claims
- 2549US5974868ADownstream monitor for CMP brush cleanersIBM·Filed 1998·Granted Nov 2, 1999·13 cites·11 claims
- 2646US5935869AMethod of planarizing semiconductor wafersIBM·Filed 1997·Granted Aug 10, 1999·14 cites·8 claims
- 2742US6387810B2Method for homogenizing device parameters through photoresist planarizationIBM·Filed 1999·Granted May 14, 2002·11 cites·12 claims
- 2839US2002182866A1Off-concentric polishing system designFiled 2002·Application pending·0 cites
- 2936US2001023166A1Wafer carrier rinsing mechanismFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →