Inventor · disambiguated record
Darin Bivens
Also filed as: BIVENS DARIN
11 granted patents·4 pending applications·96 citations·filing 2006–2011
89Inventor score
Top patents by PatentIndex Score
15 records- 0192US7909961B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted Mar 22, 2011·21 cites·4 claims
- 0291US7520999B2Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one anotherAPPLIED MATERIALS INC·Filed 2006·Granted Apr 21, 2009·16 cites·20 claims
- 0390US7943005B2Method and apparatus for photomask plasma etchingAPPLIED MATERIALS INC·Filed 2006·Granted May 17, 2011·15 cites·19 claims
- 0488US7967930B2Plasma reactor for processing a workpiece and having a tunable cathodeAPPLIED MATERIALS INC·Filed 2006·Granted Jun 28, 2011·11 cites·21 claims
- 0587US7504041B2Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicatorAPPLIED MATERIALS INC·Filed 2006·Granted Mar 17, 2009·13 cites·15 claims
- 0682US8002946B2Mask etch plasma reactor with cathode providing a uniform distribution of etch rateAPPLIED MATERIALS INC·Filed 2006·Granted Aug 23, 2011·8 cites·11 claims
- 0775US8012366B2Process for etching a transparent workpiece including backside endpoint detection stepsAPPLIED MATERIALS INC·Filed 2006·Granted Sep 6, 2011·3 cites·16 claims
- 0872US7964818B2Method and apparatus for photomask etchingAPPLIED MATERIALS INC·Filed 2006·Granted Jun 21, 2011·3 cites·11 claims
- 0972US7419551B2Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one anotherAPPLIED MATERIALS INC·Filed 2006·Granted Sep 2, 2008·4 cites·16 claims
- 1065US7431797B2Plasma reactor with a dynamically adjustable plasma source power applicatorAPPLIED MATERIALS INC·Filed 2006·Granted Oct 7, 2008·2 cites·19 claims
- 1148US8568553B2Method and apparatus for photomask plasma etchingKUMAR AJAY·Filed 2011·Granted Oct 29, 2013·0 cites·20 claims
- 1248US2008099437A1Plasma reactor for processing a transparent workpiece with backside process endpoint detectionLEWINGTON RICHARD·Filed 2006·Application pending·0 cites
- 1342US2009325387A1Methods and apparatus for in-situ chamber dry clean during photomask plasma etchingAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 1435US2010276391A1Inductively coupled plasma reactor having rf phase control and methods of use thereofAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 1531US2011236806A1Dc voltage charging of cathode for plasma strikingAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →