Inventor · disambiguated record
Daniel Hernandez Castillo, Ii
Also filed as: CASTILLO DANIEL · CASTILLO DANIEL H II · CASTILLO DANIEL HERNANDEZ · CASTILLO II DANIEL HERNANDEZ
10 granted patents·4 pending applications·72 citations·filing 2003–2016
87Inventor score
Technology areasH10P
Files withDUPONT AIR PROD NANOMATERIALS5AIR PROD & CHEM4SIDDIQUI JUNAID AHMED2HENRY JAMES MATTHEW1SIDDIQUI JUNAID A1
Top patents by PatentIndex Score
14 records- 0191US7513920B2Free radical-forming activator attached to solid and used to enhance CMP formulationsDUPONT AIR PROD NANOMATERIALS·Filed 2005·Granted Apr 7, 2009·17 cites·7 claims
- 0290US6979252B1Low defectivity product slurry for CMP and associated production methodDUPONT AIR PROD NANOMATERIALS·Filed 2005·Granted Dec 27, 2005·23 cites·13 claims
- 0385US7351662B2Composition and associated method for catalyzing removal rates of dielectric films during chemical mechanical planarizationDUPONT AIR PROD NANOMATERIALS·Filed 2005·Granted Apr 1, 2008·11 cites·23 claims
- 0484US8114775B2Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizersSIDDIQUI JUNAID AHMED·Filed 2009·Granted Feb 14, 2012·11 cites·11 claims
- 0581US7476620B2Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizersDUPONT AIR PROD NANOMATERIALS·Filed 2006·Granted Jan 13, 2009·8 cites·14 claims
- 0673US9062230B2Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereofAIR PROD & CHEM·Filed 2014·Granted Jun 23, 2015·2 cites·9 claims
- 0754US10011741B2Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereofAIR PROD & CHEM·Filed 2016·Granted Jul 3, 2018·0 cites·8 claims
- 0854US8859428B2Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereofAIR PROD & CHEM·Filed 2013·Granted Oct 14, 2014·0 cites·8 claims
- 0953US2009250656A1Free Radical-Forming Activator Attached to Solid and Used to Enhance CMP FormulationsSIDDIQUI JUNAID AHMED·Filed 2009·Application pending·0 cites
- 1052US9305476B2Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereofAIR PROD & CHEM·Filed 2015·Granted Apr 5, 2016·0 cites·11 claims
- 1142US2007075042A1Stabilizer-Fenton's reaction metal-vinyl pyridine polymer-surface-modified chemical mechanical planarization composition and associated methodSIDDIQUI JUNAID A·Filed 2006·Application pending·0 cites
- 1237US2011237079A1Method for exposing through-base wafer vias for fabrication of stacked devicesDUPONT AIR PROD NANOMATERIALS·Filed 2010·Application pending·0 cites
- 1332US2004191417A1Method of integrating a porous dielectric in an integrated circuit deviceFiled 2003·Application pending·0 cites
- 1431US8916473B2Method for forming through-base wafer vias for fabrication of stacked devicesHENRY JAMES MATTHEW·Filed 2010·Granted Dec 23, 2014·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →