Inventor · disambiguated record
Danilo Crippa
Also filed as: CRIPPA DANILO
7 granted patents·13 pending applications·6 citations·filing 2002–2025
74Inventor score
Top patents by PatentIndex Score
20 records- 0164US2025084559A1Reactor for epitaxial deposition of semiconductor material on substrates with sliding sledge for reaction chamberLPE SPA·Filed 2024·Application pending·0 cites
- 0258US2025351499A1Heterojunction semiconductor power devices using different bandgap semiconductorsMAXPOWER SEMICONDUCTOR INC·Filed 2025·Application pending·0 cites
- 0356US2024417851A1Apparatus for manufacturing semiconductor devicesLPE SPA·Filed 2024·Application pending·0 cites
- 0453US12331423B2Reaction chamber for a deposition reactor with interspace and lower closing element and reactorLPE SPA·Filed 2020·Granted Jun 17, 2025·0 cites·24 claims
- 0550US12371779B2Reaction chamber comprising a rotating element for the deposition of a semiconductor materialLPE SPA·Filed 2020·Granted Jul 29, 2025·0 cites·13 claims
- 0650US2025313991A1Method and system for obtaining high-quality cubic silicon carbideLPE S PA·Filed 2025·Application pending·0 cites
- 0749US2022025519A1Deposition reactor with inductors and electromagnetic shieldsLPE SPA·Filed 2019·Application pending·0 cites
- 0848US2010031885A1Reactor For Growing CrystalsPELOSI CLAUDIO·Filed 2007·Application pending·0 cites
- 0945US7615121B2Susceptor systemE T C EPITAXIAL TECHNOLOGY CT·Filed 2002·Granted Nov 10, 2009·2 cites·27 claims
- 1044US7488922B2Susceptor systemE T C EPITAXIAL TECHNOLOGY CT·Filed 2002·Granted Feb 10, 2009·2 cites·25 claims
- 1143US7387687B2Support system for a treatment apparatusE T C EPITAXIAL TECHNOLOGY CT·Filed 2003·Granted Jun 17, 2008·2 cites·20 claims
- 1242US2010037825A1Differentiated-temperature reaction chamberLPE SPA·Filed 2006·Application pending·0 cites
- 1339US2008190357A1Susceptor for Expitaxial Reactors and Tool for the Handling ThereofLPE SPA·Filed 2006·Application pending·0 cites
- 1438US2007264807A1Cleaining Process and Operating Process for a Cvd ReactorLEONE STEFANO·Filed 2005·Application pending·0 cites
- 1538US2008210169A1System for Supporting and Rotating a Susceptor Inside a Treatment Chamber of a Wafer Treating ApparatusLPE SPA·Filed 2005·Application pending·0 cites
- 1637US10392723B2Reaction chamber for epitaxial growth with a loading/unloading device and reactorLPE SPA·Filed 2014·Granted Aug 27, 2019·0 cites·14 claims
- 1736US2010025696A1Process for Producing a Silicon Carbide Substrate for Microelectric ApplicationsABBONDANZA GIUSEPPE·Filed 2007·Application pending·0 cites
- 1836US2006283389A1System for growing silicon carbide crystalsVALENTE GIANLUCA·Filed 2005·Application pending·0 cites
- 1933US2006275104A1Support system for treatment apparatusesE T C EPITAXIAL TECHNOLOGY CT·Filed 2004·Application pending·0 cites
- 2029US10697087B2Susceptor with supporting elementLPE SPA·Filed 2016·Granted Jun 30, 2020·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →