Inventor · disambiguated record
Daniel Distaso
Also filed as: DISTASO DANIEL
13 granted patents·5 pending applications·188 citations·filing 2001–2024
91Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT7APPLIED MATERIALS INC3VARIAN SEMICONDUCTOR EQUIPMENT ASS INC3DISTASO DANIEL2BILOIU COSTEL1
Top patents by PatentIndex Score
18 records- 0196US10904996B2Substrate support with electrically floating power supplyAPPLIED MATERIALS INC·Filed 2017·Granted Jan 26, 2021·43 cites·19 claims
- 0294US6777686B2Control system for indirectly heated cathode ion sourceVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2001·Granted Aug 17, 2004·61 cites·10 claims
- 0390US7138768B2Indirectly heated cathode ion sourceVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2002·Granted Nov 21, 2006·49 cites·29 claims
- 0489US8590485B2Small form factor plasma source for high density wide ribbon ion beam generationBILOIU COSTEL·Filed 2010·Granted Nov 26, 2013·11 cites·20 claims
- 0582US8461554B1Apparatus and method for charge neutralization during processing of a workpieceKURUNCZI PETER F·Filed 2011·Granted Jun 11, 2013·6 cites·19 claims
- 0680US11456205B2Methods for variable etch depthsAPPLIED MATERIALS INC·Filed 2020·Granted Sep 27, 2022·1 cites·20 claims
- 0779US9118001B2Techniques for treating sidewalls of patterned structures using angled ion treatmentVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Aug 25, 2015·4 cites·17 claims
- 0877US10081861B2Selective processing of a workpieceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Sep 25, 2018·2 cites·10 claims
- 0975US9336998B2Apparatus and method for dynamic control of ion beam energy and angleVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted May 10, 2016·3 cites·18 claims
- 1068US9734991B2Negative ribbon ion beams from pulsed plasmasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Aug 15, 2017·1 cites·20 claims
- 1158US7878145B2Monitoring plasma ion implantation systems for fault detection and process controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Granted Feb 1, 2011·7 cites·17 claims
- 1258US2025391633A1Ion extraction optics with dynamic extraction angle controlAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1357US10290470B2Negative ribbon ion beams from pulsed plasmasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted May 14, 2019·0 cites·14 claims
- 1447US2008245957A1Tuning an ion implanter for optimal performanceGUPTA ATUL·Filed 2007·Application pending·0 cites
- 1545US2009104719A1Plasma Doping System with In-Situ Chamber Condition MonitoringVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Application pending·0 cites
- 1639US8461556B2Using beam blockers to perform a patterned implant of a workpieceDISTASO DANIEL·Filed 2010·Granted Jun 11, 2013·0 cites·17 claims
- 1735US2016111254A1Workpiece Processing Method And ApparatusVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2015·Application pending·0 cites
- 1832US2012056107A1Uniformity control using ion beam blockersDISTASO DANIEL·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →