Inventor · disambiguated record
Daijitsu Harada
Also filed as: HARADA DAIJITSU
34 granted patents·12 pending applications·15 citations·filing 2008–2024
93Inventor score
Files withSHINETSU CHEMICAL CO35HARADA DAIJITSU4HONMA TAKAYUKI2MATSUI HARUNOBU2KYORITSU CHEMICAL & CO LTD1
Top patents by PatentIndex Score
46 records- 0185US8360824B2Method of processing synthetic quartz glass substrate for semiconductorSHINETSU CHEMICAL CO·Filed 2010·Granted Jan 29, 2013·6 cites·14 claims
- 0280US12117724B2Mask blank glass substrateSHINETSU CHEMICAL CO·Filed 2023·Granted Oct 15, 2024·0 cites·10 claims
- 0379US11424389B2Synthetic quartz glass cavity member, synthetic quartz glass cavity lid, optical device package, and making methodsSHINETSU CHEMICAL CO·Filed 2019·Granted Aug 23, 2022·2 cites·14 claims
- 0478US10829411B2Rectangular glass substrate and method for preparing the sameSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 10, 2020·2 cites·6 claims
- 0571US11757067B2Synthetic quartz glass cavity member, synthetic quartz glass cavity lid, optical device package, and making methodsSHINETSU CHEMICAL CO·Filed 2022·Granted Sep 12, 2023·0 cites·5 claims
- 0670US9616542B2Manufacture of synthetic quartz glass substrateSHINETSU CHEMICAL CO·Filed 2013·Granted Apr 11, 2017·1 cites·16 claims
- 0769US11835853B2Mask blank glass substrateSHINETSU CHEMICAL CO·Filed 2021·Granted Dec 5, 2023·0 cites·6 claims
- 0868US8500517B2Preparation of synthetic quartz glass substratesHARADA DAIJITSU·Filed 2010·Granted Aug 6, 2013·2 cites·8 claims
- 0967US2024393699A1Mask blank substrate and manufacturing method thereofSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1066US12498506B2Window material for optical element, lid for optical element package, optical element package, and optical deviceSHINETSU CHEMICAL CO·Filed 2022·Granted Dec 16, 2025·0 cites·16 claims
- 1166US9919962B2Polishing agent for synthetic quartz glass substrateSHINETSU CHEMICAL CO·Filed 2014·Granted Mar 20, 2018·0 cites·11 claims
- 1265US2023398655A1Substrate and method for producing the sameSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1365US2024250223A1Window material for optical element, lid for optical element package, and optical element packageSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1463US11591260B2Large-size synthetic quartz glass substrate, evaluation method, and manufacturing methodSHINETSU CHEMICAL CO·Filed 2020·Granted Feb 28, 2023·0 cites·4 claims
- 1560US2023418149A1Substrate for mask blanks and method for manufacturing the sameSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1659US8168272B2Storage container for photomask-forming synthetic quartz glass substrateMORIKAWA MAMORU·Filed 2008·Granted May 1, 2012·2 cites·11 claims
- 1759US2010243950A1Polishing agent for synthetic quartz glass substrateHARADA DAIJITSU·Filed 2009·Application pending·0 cites
- 1858US10865139B2Large-size synthetic quartz glass substrate, evaluation method, and manufacturing methodSHINETSU CHEMICAL CO·Filed 2018·Granted Dec 15, 2020·0 cites·7 claims
- 1958US9731396B2Method of preparing synthetic quartz glass substrateSHINETSU CHEMICAL CO·Filed 2015·Granted Aug 15, 2017·0 cites·5 claims
- 2058US2014242884A1Synethetic quartz glass subtrate polishing slurry and manufacture of synethetic quartz glass substrate using the sameSHINETSU CHEMICAL CO·Filed 2014·Application pending·0 cites
- 2157US12242025B2Synthetic quartz glass substrate with antireflection film, window material, lid for optical element package, optical element package, and light irradiation deviceSHINETSU CHEMICAL CO·Filed 2021·Granted Mar 4, 2025·0 cites·13 claims
- 2257US10756239B2Synthetic quartz glass lid and optical device packageSHINETSU CHEMICAL CO·Filed 2017·Granted Aug 25, 2020·0 cites·8 claims
- 2357US10093833B2Colloidal silica polishing composition and method for manufacturing synthetic quartz glass substrates using the sameSHINETSU CHEMICAL CO·Filed 2014·Granted Oct 9, 2018·0 cites·12 claims
- 2456US10086493B2Method for producing substratesSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 2, 2018·0 cites·15 claims
- 2556US9316902B2Photomask-forming glass substrate and making methodSHINETSU CHEMICAL CO·Filed 2013·Granted Apr 19, 2016·0 cites·4 claims
- 2656US2023037856A1Mask blanks substrate and method for manufacturing the sameSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 2754US9487426B2Heat treatment method of synthetic quartz glassSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 8, 2016·0 cites·10 claims
- 2853US2022372331A1Polishing compositionSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 2952US9505166B2Rectangular mold-forming substrateSHINETSU CHEMICAL CO·Filed 2013·Granted Nov 29, 2016·0 cites·7 claims
- 3051US2022149247A1Bonding and sealing material, and lid for optical device packageSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 3150US10865141B2Synthetic quartz glass lid precursor, synthetic quartz glass lid, and preparation methods thereofSHINETSU CHEMICAL CO·Filed 2018·Granted Dec 15, 2020·0 cites·11 claims
- 3250US10065285B2Method of preparing substrateSHINETSU CHEMICAL CO·Filed 2012·Granted Sep 4, 2018·0 cites·5 claims
- 3349US10737966B2Method for preparing synthetic quartz glass substrateSHINETSU CHEMICAL CO·Filed 2017·Granted Aug 11, 2020·0 cites·7 claims
- 3449US9309447B2Method for recovery of cerium oxideSHINETSU CHEMICAL CO·Filed 2012·Granted Apr 12, 2016·0 cites·6 claims
- 3548US2021351326A1Lid for optical element package, optical element package, and manufacturing method for lid for optical element package and optical element packageSHINETSU CHEMICAL CO·Filed 2019·Application pending·0 cites
- 3647US8536359B2Alkoxysilane compounds having fluoroalkyl group and method of preparing the sameHONMA TAKAYUKI·Filed 2012·Granted Sep 17, 2013·0 cites·4 claims
- 3747US2012021675A1Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the sameMATSUI HARUNOBU·Filed 2011·Application pending·0 cites
- 3847US2021316405A1Composition for sealingKYORITSU CHEMICAL & CO LTD·Filed 2019·Application pending·0 cites
- 3946US10611676B2Method for preparing synthetic quartz glass substrateSHINETSU CHEMICAL CO·Filed 2015·Granted Apr 7, 2020·0 cites·19 claims
- 4046US9963634B2Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the sameSHINETSU CHEMICAL CO·Filed 2012·Granted May 8, 2018·0 cites·2 claims
- 4145US10558116B2Method for preparing synthetic quartz glass substrateSHINETSU CHEMICAL CO·Filed 2016·Granted Feb 11, 2020·0 cites·16 claims
- 4245US8927754B2Silazane compounds having fluoroalkyl group and method of preparing the sameHONMA TAKAYUKI·Filed 2012·Granted Jan 6, 2015·0 cites·5 claims
- 4344US8551346B2Photomask-forming glass substrate and making methodHARADA DAIJITSU·Filed 2010·Granted Oct 8, 2013·0 cites·7 claims
- 4443US10948817B2Mold-forming substrate and inspection methodHARADA DAIJITSU·Filed 2012·Granted Mar 16, 2021·0 cites·14 claims
- 4543US9090502B2Nanoimprint-mold release agent, surface treatment method, and nanoimprint moldYAMAZAKI HIROYUKI·Filed 2012·Granted Jul 28, 2015·0 cites·6 claims
- 4637US9598305B2Synthetic quartz glass substrate and making methodMATSUI HARUNOBU·Filed 2011·Granted Mar 21, 2017·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →