Polishing agent for synthetic quartz glass substrate

Abstract

Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.

1 . A polishing slurry for synthetic quartz glass substrates, comprising a colloidal solution and a component selected from the group consisting of a carboxylic acid polymer, an acidic amino acid, a phenol, and a glycosaminoglycan, said colloidal solution having a colloid concentration of 20 to 50% by mass. 
     
     
         2 . The polishing slurry for synthetic quartz glass substrates of  claim 1  wherein the colloidal solution is a colloidal silica dispersion. 
     
     
         3 . The polishing slurry for synthetic quartz glass substrates of  claim 1  or  2  wherein the carboxylic acid polymer is an acrylic acid polymer. 
     
     
         4 . The polishing slurry for synthetic quartz glass substrates of  claim 1  or  2  wherein the acidic amino acid is aspartic acid or glutamic acid. 
     
     
         5 . The polishing slurry for synthetic quartz glass substrates of  claim 1  or  2  wherein the phenol is catechol, resorcinol or hydroquinone. 
     
     
         6 . The polishing slurry for synthetic quartz glass substrates of  claim 1  or  2  wherein the glycosaminoglycan is hyaluronic acid. 
     
     
         7 . The polishing slurry for synthetic quartz glass substrates of  claim 1 , having pH 9 to 10.5. 
     
     
         8 . The polishing slurry for synthetic quartz glass substrates of  claim 7  wherein the pH is adjusted with one or more selected from the group consisting of an alkali metal hydroxide, alkaline earth metal hydroxide, basic salt, amine, and ammonia. 
     
     
         9 . The polishing slurry for synthetic quartz glass substrates of  claim 1  wherein the synthetic quartz glass substrate is a photomask-forming synthetic quartz substrate.