Inventor · disambiguated record
Daisuke Kawana
Also filed as: KAWANA DAISUKE
18 granted patents·17 pending applications·47 citations·filing 2001–2021
91Inventor score
Top patents by PatentIndex Score
35 records- 0193US9766541B2Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Sep 19, 2017·10 cites·16 claims
- 0292US10101658B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Oct 16, 2018·6 cites·20 claims
- 0379US10324377B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Jun 18, 2019·2 cites·8 claims
- 0479US7318992B2Lift-off positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jan 15, 2008·6 cites·12 claims
- 0572US7261994B2Positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Aug 28, 2007·4 cites·9 claims
- 0668US8227169B2Compound, acid generator, resist composition, and method of forming resist patternKAWAUE AKIYA·Filed 2008·Granted Jul 24, 2012·2 cites·9 claims
- 0763US11472956B2Resin composition for forming phase-separated structure, method for producing structure including phase-separated structure, and block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Oct 18, 2022·0 cites·5 claims
- 0861US11780946B2Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Oct 10, 2023·0 cites·10 claims
- 0959US7666569B2Positive resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Feb 23, 2010·6 cites·2 claims
- 1058US2009311625A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2009·Application pending·0 cites
- 1157US8216763B2Photosensitive resin composition and method of forming patternSATO KAZUFUMI·Filed 2006·Granted Jul 10, 2012·1 cites·14 claims
- 1256US2008227027A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2008·Application pending·0 cites
- 1355US11560444B2Method of producing block copolymer capable of creating specific structure patternTOKYO OHKA KOGYO CO LTD·Filed 2020·Granted Jan 24, 2023·0 cites·7 claims
- 1453US2007141514A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2007·Application pending·0 cites
- 1553US2009068586A1Silsesquioxane resin, positive resist composition, resist laminate, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Application pending·0 cites
- 1651US11747724B2Organically modified metal oxide nanoparticles, organically modified metal oxide nanoparticles-containing solution, organically modified metal oxide nanoparticles-containing resist composition, and resist pattern forming methodAIST·Filed 2020·Granted Sep 5, 2023·0 cites·8 claims
- 1751US2022171286A1Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2021·Application pending·0 cites
- 1850US7416832B2Positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Aug 26, 2008·4 cites·12 claims
- 1950US2005266346A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2005·Application pending·0 cites
- 2049US10941253B2Block copolymer, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Mar 9, 2021·0 cites·12 claims
- 2147US2006292488A1Composition for formation of antireflection film, and antireflection film in which the same is usedTOKYO OHKA KOGYO CO LTD·Filed 2006·Application pending·0 cites
- 2247US2007281098A1Composition for forming antireflection coatingHIRAYAMA TAKU·Filed 2007·Application pending·0 cites
- 2344US9057948B2Resist composition for EUV or EB, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Jun 16, 2015·0 cites·5 claims
- 2444US6787290B2Positive-working photoresist composition and resist patterning method using sameTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Sep 7, 2004·6 cites·8 claims
- 2544US2008312400A1Composition for forming resist underlayer film, and resist underlayer filmTOKYO OHKA KOGYO CO LTD·Filed 2008·Application pending·0 cites
- 2643US11261299B2Block copolymer and method of producing the same, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Mar 1, 2022·0 cites·5 claims
- 2743US7785768B2Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefromTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Aug 31, 2010·0 cites·7 claims
- 2843US2014093824A1Resist composition for euv or eb and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2013·Application pending·0 cites
- 2943US2006021964A1Composition for forming antireflection coatingHIRAYAMA TAKU·Filed 2005·Application pending·0 cites
- 3043US2004248033A1Method for forming photoresist pattern and photoresist laminateFiled 2004·Application pending·0 cites
- 3142US2005282090A1Composition for forming antireflection coatingHIRAYAMA KAWASAKI-SHI·Filed 2003·Application pending·0 cites
- 3241US2003129534A1Method for forming photoresist pattern and photoresist laminateFiled 2002·Application pending·0 cites
- 3339US2006222866A1Silsesquioxane resin, positive resist composition,layered product including resist and method of forming resist patternNAKAMURA TSUYOSHI·Filed 2004·Application pending·0 cites
- 3437US2007009828A1Positive resist composition, resist laminates and process for forming resist patternsTOKYO OHKA KOGYO CO LTD·Filed 2004·Application pending·0 cites
- 3530US2006003252A1Chemical amplification type silicone based positive photoresist compositionHIRAYAMA TAKU·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →