Inventor · disambiguated record
Dai Kitagawa
Also filed as: KITAGAWA DAI
13 granted patents·5 pending applications·59 citations·filing 2014–2025
87Inventor score
Top patents by PatentIndex Score
18 records- 0196US10199246B2Temperature control mechanism, temperature control method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Feb 5, 2019·44 cites·5 claims
- 0289US10512125B2Mounting table and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Dec 17, 2019·7 cites·15 claims
- 0388US11705302B2Substrate support and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jul 18, 2023·2 cites·12 claims
- 0481US11373884B2Placing table and plasma treatment apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jun 28, 2022·1 cites·8 claims
- 0576US10679869B2Placing table and plasma treatment apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Jun 9, 2020·2 cites·5 claims
- 0676US9209043B2Semiconductor manufacturing method and semiconductor manufacturing apparatusPANASONIC IP MAN CO LTD·Filed 2015·Granted Dec 8, 2015·2 cites·5 claims
- 0771US12463021B2Substrate processing apparatus and maintenance method for substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Nov 4, 2025·0 cites·31 claims
- 0865US11756806B2Heater power feeding mechanismTOKYO ELECTRON LTD·Filed 2021·Granted Sep 12, 2023·0 cites·16 claims
- 0965US11121009B2Power feeding mechanism and method for controlling temperature of a stageTOKYO ELECTRON LTD·Filed 2015·Granted Sep 14, 2021·1 cites·2 claims
- 1062US11756807B2Power feeding mechanism and method for controlling temperature of a stageTOKYO ELECTRON LTD·Filed 2021·Granted Sep 12, 2023·0 cites·12 claims
- 1160US11743973B2Placing table and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Aug 29, 2023·0 cites·18 claims
- 1253US2023141911A1Substrate processing systemTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1347US2025210329A1Plasma processing apparatus, substrate processing system, and fixtureTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1445US2017140958A1Heater power feeding mechanismTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 1544US2015373783A1Placing table and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 1643US10374358B2Feeder-cover structure and semiconductor production apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Aug 6, 2019·0 cites·9 claims
- 1739US2018144945A1Placing unit and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1835US10593522B2Electrostatic chuck, placing table and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Mar 17, 2020·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →