Inventor · disambiguated record
David Knick
Also filed as: KNICK DAVID
1 granted patent·2 pending applications·0 citations·filing 2008–2016
10Inventor score
Files withAPPLIED MATERIALS INC3
Top patents by PatentIndex Score
3 records- 0149US10115572B2Methods for in-situ chamber clean in plasma etching processing chamberAPPLIED MATERIALS INC·Filed 2016·Granted Oct 30, 2018·0 cites·16 claims
- 0242US2009325387A1Methods and apparatus for in-situ chamber dry clean during photomask plasma etchingAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 0331US2011236806A1Dc voltage charging of cathode for plasma strikingAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when David Knick files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →