Inventor · disambiguated record
Dan Maydan
Also filed as: MAYDAN DAN
103 granted patents·19 pending applications·16,770 citations·filing 1976–2024
99Inventor score
Files withAPPLIED MATERIALS INC77COGENRA SOLAR INC13BELL TELEPHONE LABOR INC9SUNPOWER CORP9APPLIED KOMATSU TECHNOLOGY INC6
Top patents by PatentIndex Score
122 records- 0199US7110629B2Optical ready substratesAPPLIED MATERIALS INC·Filed 2003·Granted Sep 19, 2006·314 cites·21 claims
- 0299US7043106B2Optical ready wafersAPPLIED MATERIALS INC·Filed 2002·Granted May 9, 2006·297 cites·31 claims
- 0399US6825134B2Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flowAPPLIED MATERIALS INC·Filed 2002·Granted Nov 30, 2004·595 cites·33 claims
- 0499US5362526APlasma-enhanced CVD process using TEOS for depositing silicon oxideAPPLIED MATERIALS INC·Filed 1991·Granted Nov 8, 1994·484 cites·15 claims
- 0599US5186718AStaged-vacuum wafer processing system and methodAPPLIED MATERIALS INC·Filed 1991·Granted Feb 16, 1993·998 cites·23 claims
- 0699US5000113AThermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized processAPPLIED MATERIALS INC·Filed 1986·Granted Mar 19, 1991·1.1k cites·19 claims
- 0799US4962063AMultistep planarized chemical vapor deposition process with the use of low melting inorganic material for flowing while depositingAPPLIED MATERIALS INC·Filed 1989·Granted Oct 9, 1990·455 cites·21 claims
- 0899US4892753AProcess for PECVD of silicon oxide using TEOS decompositionAPPLIED MATERIALS INC·Filed 1988·Granted Jan 9, 1990·503 cites·12 claims
- 0999US4872947ACVD of silicon oxide using TEOS decomposition and in-situ planarization processAPPLIED MATERIALS INC·Filed 1988·Granted Oct 10, 1989·522 cites·14 claims
- 1099US4854263AInlet manifold and methods for increasing gas dissociation and for PECVD of dielectric filmsAPPLIED MATERIALS INC·Filed 1987·Granted Aug 8, 1989·791 cites·11 claims
- 1199US4668365AApparatus and method for magnetron-enhanced plasma-assisted chemical vapor depositionAPPLIED MATERIALS INC·Filed 1984·Granted May 26, 1987·229 cites·22 claims
- 1298US9484484B2Shingled solar cell moduleSUNPOWER CORP·Filed 2015·Granted Nov 1, 2016·41 cites·21 claims
- 1398US9397252B2Shingled solar cell moduleCOGENRA SOLAR INC·Filed 2015·Granted Jul 19, 2016·19 cites·38 claims
- 1498US6167834B1Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized processAPPLIED MATERIALS INC·Filed 1992·Granted Jan 2, 2001·367 cites·5 claims
- 1598US5885358AGas injection slit nozzle for a plasma process reactorAPPLIED MATERIALS INC·Filed 1996·Granted Mar 23, 1999·203 cites·30 claims
- 1698US5882165AMultiple chamber integrated process systemAPPLIED MATERIALS INC·Filed 1997·Granted Mar 16, 1999·789 cites·8 claims
- 1798US5855681AUltra high throughput wafer vacuum processing systemAPPLIED MATERIALS INC·Filed 1996·Granted Jan 5, 1999·1.1k cites·50 claims
- 1898US5849136AHigh frequency semiconductor wafer processing apparatus and methodAPPLIED MATERIALS INC·Filed 1996·Granted Dec 15, 1998·188 cites·11 claims
- 1998US5788778ADeposition chamber cleaning technique using a high power remote excitation sourceAPPLIED KOMATSU TECHNOLOGY INC·Filed 1996·Granted Aug 4, 1998·281 cites·21 claims
- 2098US5643394AGas injection slit nozzle for a plasma process reactorAPPLIED MATERIALS INC·Filed 1994·Granted Jul 1, 1997·215 cites·73 claims
- 2198US4951601AMulti-chamber integrated process systemAPPLIED MATERIALS INC·Filed 1989·Granted Aug 28, 1990·1.3k cites·22 claims
- 2297US9882077B2Shingled solar cell moduleSUNPOWER CORP·Filed 2014·Granted Jan 30, 2018·13 cites·33 claims
- 2397US9356184B2Shingled solar cell moduleCOGENRA SOLAR INC·Filed 2014·Granted May 31, 2016·18 cites·30 claims
- 2497US6893907B2Fabrication of silicon-on-insulator structure using plasma immersion ion implantationAPPLIED MATERIALS INC·Filed 2004·Granted May 17, 2005·127 cites·59 claims
- 2597US6170428B1Symmetric tunable inductively coupled HDP-CVD reactorAPPLIED MATERIALS INC·Filed 1996·Granted Jan 9, 2001·430 cites·26 claims
- 2697US6108189AElectrostatic chuck having improved gas conduitsAPPLIED MATERIALS INC·Filed 1997·Granted Aug 22, 2000·255 cites·64 claims
- 2797US5746875AGas injection slit nozzle for a plasma process reactorAPPLIED MATERIALS INC·Filed 1995·Granted May 5, 1998·169 cites·18 claims
- 2897US5618382AHigh-frequency semiconductor wafer processing apparatus and methodAPPLIED MATERIALS INC·Filed 1993·Granted Apr 8, 1997·125 cites·7 claims
- 2997US4842683AMagnetic field-enhanced plasma etch reactorAPPLIED MATERIALS INC·Filed 1988·Granted Jun 27, 1989·410 cites·16 claims
- 3096US6721162B2Electrostatic chuck having composite dielectric layer and method of manufactureAPPLIED MATERIALS INC·Filed 2002·Granted Apr 13, 2004·76 cites·20 claims
- 3196US6503375B1Electroplating apparatus using a perforated phosphorus doped consumable anodeAPPLIED MATERIALS INC·Filed 2000·Granted Jan 7, 2003·93 cites·7 claims
- 3296US5300460AUHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafersAPPLIED MATERIALS INC·Filed 1993·Granted Apr 5, 1994·109 cites·26 claims
- 3396US5292393AMultichamber integrated process systemAPPLIED MATERIALS INC·Filed 1991·Granted Mar 8, 1994·386 cites·11 claims
- 3496US5210466AVHF/UHF reactor systemAPPLIED MATERIALS INC·Filed 1992·Granted May 11, 1993·124 cites·17 claims
- 3596US4618262ALaser interferometer system and method for monitoring and controlling IC processingAPPLIED MATERIALS INC·Filed 1984·Granted Oct 21, 1986·209 cites·25 claims
- 3696US4310380APlasma etching of siliconBELL TELEPHONE LABOR INC·Filed 1980·Granted Jan 12, 1982·136 cites·6 claims
- 3796US4298443AHigh capacity etching apparatus and methodBELL TELEPHONE LABOR INC·Filed 1979·Granted Nov 3, 1981·80 cites·15 claims
- 3895US6055927AApparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technologyAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted May 2, 2000·129 cites·15 claims
- 3994US6829056B1Monitoring dimensions of features at different locations in the processing of substratesFiled 2003·Granted Dec 7, 2004·107 cites·19 claims
- 4094US6414834B1Dielectric covered electrostatic chuckAPPLIED MATERIALS INC·Filed 2000·Granted Jul 2, 2002·56 cites·34 claims
- 4194US5720818AConduits for flow of heat transfer fluid to the surface of an electrostatic chuckAPPLIED MATERIALS INC·Filed 1996·Granted Feb 24, 1998·150 cites·51 claims
- 4294US5354715AThermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized processAPPLIED MATERIALS INC·Filed 1992·Granted Oct 11, 1994·132 cites·16 claims
- 4393US11038072B2Shingled solar cell moduleSUNPOWER CORP·Filed 2018·Granted Jun 15, 2021·4 cites·28 claims
- 4493US10090430B2System for manufacturing a shingled solar cell moduleSUNPOWER CORP·Filed 2016·Granted Oct 2, 2018·7 cites·20 claims
- 4593US6109206ARemote plasma source for chamber cleaningAPPLIED MATERIALS INC·Filed 1997·Granted Aug 29, 2000·138 cites·19 claims
- 4693US5399387APlasma CVD of silicon nitride thin films on large area glass substrates at high deposition ratesAPPLIED MATERIALS INC·Filed 1994·Granted Mar 21, 1995·127 cites·7 claims
- 4793US5215619AMagnetic field-enhanced plasma etch reactorAPPLIED MATERIALS INC·Filed 1991·Granted Jun 1, 1993·194 cites·25 claims
- 4893US4162528AX-ray-fluorescence measurement of thin film thicknessesBELL TELEPHONE LABOR INC·Filed 1978·Granted Jul 24, 1979·67 cites·10 claims
- 4993US4037111AMask structures for X-ray lithographyBELL TELEPHONE LABOR INC·Filed 1976·Granted Jul 19, 1977·57 cites·22 claims
- 5092US9401451B2Shingled solar cell moduleCOGENRA SOLAR INC·Filed 2014·Granted Jul 26, 2016·3 cites·37 claims
Showing the top 50 of 122 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →