Inventor · disambiguated record
Dan Rittman
Also filed as: RITTMAN DAN
4 granted patents·16 pending applications·89 citations·filing 2002–2015
79Inventor score
Top patents by PatentIndex Score
20 records- 0185US6782524B2Photomask and integrated circuit manufactured by automatically correcting design rule violations in a mask layout fileDUPONT PHOTOMASKS INC·Filed 2002·Granted Aug 24, 2004·33 cites·20 claims
- 0278US6782516B2System and method for eliminating design rule violations during construction of a mask layout blockDUPONT PHOTOMASKS INC·Filed 2002·Granted Aug 24, 2004·27 cites·29 claims
- 0368US6782517B2Photomask and integrated circuit manufactured by automatically eliminating design rule violations during construction of a mask layout blockDUPONT PHOTOMASKS INC·Filed 2002·Granted Aug 24, 2004·14 cites·26 claims
- 0467US6907587B2System and method for correcting connectivity errors in a mask layout fileDUPONT PHOTOMASKS INC·Filed 2002·Granted Jun 14, 2005·15 cites·22 claims
- 0555US2010241497A1Method, system and computer software for advertisement, using symbols as characters interfaceRITTMAN DAN·Filed 2009·Application pending·0 cites
- 0646US2010286708A1System for blood vessels cleaning, such as for a coronary artery, peripheral artery or any other body vessel, based on mobile agentRITTMAN DAN·Filed 2009·Application pending·0 cites
- 0744US2005022151A1Photomask and integrated circuit manufactured by automatically eliminating design rule violations during construction of a mask layout blockFiled 2004·Application pending·0 cites
- 0844US2004268282A1System and method for eliminating design rule violations during construction of a mask layout blockRITTMAN DAN·Filed 2004·Application pending·0 cites
- 0941US2016350835A1System and method for finding possible bartering partners in both two-party and multi-party scenarios via smartphone/mobile device application.RITTMAN DAN·Filed 2015·Application pending·0 cites
- 1041US2009031264A1System and method for finding electromigration, self heat and voltage drop violations of an integrated circuit when its design and electrical characterization are incompleteRITTMAN DAN·Filed 2007·Application pending·0 cites
- 1140US2008127028A1Integrated circuits verification checks of mask layout database, via the internet method and computer softwareRITTMAN DAN·Filed 2006·Application pending·0 cites
- 1240US2008115102A1System and method for automatic elimination of connectivity mismatches during construction of a mask layout block, maintaining process design rule correctnessRITTMAN DAN·Filed 2006·Application pending·0 cites
- 1339US2008086709A1System and method for automatic elimination of electromigration and self heat violations during construction of a mask layout block, maintaining the process design rules (DRC Clean) and layout connectivity (LVS Clean) correctnessRITTMAN DAN·Filed 2006·Application pending·0 cites
- 1439US2008132213A1Method and system for measuring and displaying current weather conditions within wireless cellular phones at the cellular phone's current locationRITTMAN DAN·Filed 2006·Application pending·0 cites
- 1539US2008127020A1System and method for automatic elimination of voltage drop, also known as IR drop, violations of a mask layout block, maintaining the process design rules correctnessRITTMAN DAN·Filed 2006·Application pending·0 cites
- 1639US2008086708A1System and method for automatic elimination of electromigration and self heat violations of a mask layout block, maintaining the process design rules correctnessRITTMAN DAN·Filed 2006·Application pending·0 cites
- 1737US2006253813A1Design rule violations check (DRC) of IC's (integrated circuits) mask layout database, via the internet method and computer softwareRITTMAN DAN·Filed 2005·Application pending·0 cites
- 1837US2006200789A1Connectivity verification of IC (integrated circuit) mask layout database versus IC schematic; LVS check, (LVS: IC layout versus IC schematic) via the internet method and computer softwareRITTMAN DAN·Filed 2005·Application pending·0 cites
- 1935US2005005256A1Photomask and integrated circuit manufactured by automatically correcting design rule violations in a mask layout fileDUPONT PHOTOMASKS INC·Filed 2004·Application pending·0 cites
- 2032US2002144230A1System and method for correcting design rule violations in a mask layout fileDUPONT PHOTOMASKS INC·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →