Inventor · disambiguated record
Daiki Satoh
Also filed as: SATOH DAIKI
9 granted patents·4 pending applications·1,063 citations·filing 2005–2025
89Inventor score
Technology areasH10P
Top patents by PatentIndex Score
13 records- 0196USD559993SCover ringTOKYO ELECTRON LTD·Filed 2005·Granted Jan 15, 2008·499 cites·1 claims
- 0296USD559994SCover ringTOKYO ELECTRON LTD·Filed 2005·Granted Jan 15, 2008·529 cites·1 claims
- 0392US11830751B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Nov 28, 2023·2 cites·12 claims
- 0477USD560284SCover ringTOKYO ELECTRON LTD·Filed 2005·Granted Jan 22, 2008·25 cites·1 claims
- 0576US9613837B2Substrate processing apparatus and maintenance method thereofTOKYO ELECTRON LTD·Filed 2013·Granted Apr 4, 2017·4 cites·17 claims
- 0674US11004717B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted May 11, 2021·1 cites·12 claims
- 0762US7618515B2Focus ring, plasma etching apparatus and plasma etching methodTOKYO ELECTRON LTD·Filed 2005·Granted Nov 17, 2009·1 cites·12 claims
- 0861US12288713B2Mounting table and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Apr 29, 2025·0 cites·14 claims
- 0961US8192577B2Focus ring, plasma etching apparatus and plasma etching methodSATOH DAIKI·Filed 2009·Granted Jun 5, 2012·2 cites·8 claims
- 1061US2024339303A1Substrate support and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1157US2025246416A1Substrate support and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1250US2018090361A1Mounting table and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1345US2021319987A1Edge ring, stage and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →