Inventor · disambiguated record
Daan Maurits Slotboom
Also filed as: SLOTBOOM DAAN MAURITS
15 granted patents·4 pending applications·22 citations·filing 2010–2023
88Inventor score
Top patents by PatentIndex Score
19 records- 0189US10254658B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2016·Granted Apr 9, 2019·4 cites·16 claims
- 0289US9989858B2Apparatus operable to perform a measurement operation on a substrate, lithographic apparatus, and method of performing a measurement operation on a substrateASML NETHERLANDS BV·Filed 2014·Granted Jun 5, 2018·5 cites·20 claims
- 0387US12044980B2Method of manufacturing devicesASML NETHERLANDS BV·Filed 2019·Granted Jul 23, 2024·3 cites·20 claims
- 0481US10025193B2Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2014·Granted Jul 17, 2018·3 cites·20 claims
- 0578US11860548B2Method for characterizing a manufacturing process of semiconductor devicesASML NETHERLANDS BV·Filed 2020·Granted Jan 2, 2024·1 cites·21 claims
- 0676US2024111218A1A method for characterizing a manufacturing process of semiconductor devicesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0775US9971251B2Lithography system and a machine learning controller for such a lithography systemASML NETHERLANDS BV·Filed 2014·Granted May 15, 2018·2 cites·21 claims
- 0874US9507279B2Method of operating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2013·Granted Nov 29, 2016·2 cites·9 claims
- 0962US11860549B2Method for controlling a manufacturing apparatus and associated apparatusesASML NETHERLANDS BV·Filed 2019·Granted Jan 2, 2024·1 cites·20 claims
- 1060US10444632B2Apparatus operable to perform a measurement operation on a substrate, lithographic apparatus, and method of performing a measurement operation on a substrateASML NETHERLANDS BV·Filed 2018·Granted Oct 15, 2019·0 cites·20 claims
- 1158US11809088B2Method for controlling a lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted Nov 7, 2023·0 cites·20 claims
- 1258US10095131B2Alignment modeling and a lithographic apparatus and exposure method using the sameASML NETHERLANDS BV·Filed 2015·Granted Oct 9, 2018·1 cites·22 claims
- 1357US12306545B2Determining lithographic matching performanceASML NETHERLANDS BV·Filed 2020·Granted May 20, 2025·0 cites·20 claims
- 1449US11366396B2Method and apparatus for configuring spatial dimensions of a beam during a scanASML NETHERLANDS BV·Filed 2019·Granted Jun 21, 2022·0 cites·20 claims
- 1549US2023341785A1Lithographic apparatus, metrology systems, and methods thereofASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1646US10719011B2Method and apparatus to correct for patterning process errorASML NETHERLANDS BV·Filed 2016·Granted Jul 21, 2020·0 cites·20 claims
- 1738US10908512B2Methods of controlling a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Feb 2, 2021·0 cites·20 claims
- 1837US2012218533A1Method of calculating model parameters of a substrate, a lithographic apparatus and an apparatus for controlling lithographic processing by a lithographic apparatusLYULINA IRINA·Filed 2012·Application pending·0 cites
- 1936US2011013188A1Object Alignment Measurement Method and ApparatusASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →