Inventor · disambiguated record
Daniel R. Tieger
Also filed as: TIEGER DANIEL · TIEGER DANIEL R
25 granted patents·3 pending applications·137 citations·filing 2006–2023
95Inventor score
Files withAPPLIED MATERIALS INC10VARIAN SEMICONDUCTOR EQUIPMENT ASS INC8AXCELIS TECH INC5DIVERGILIO WILLIAM F1GRAF MICHAEL A1
Top patents by PatentIndex Score
28 records- 0197US11482397B1High output ion source, ion implanter, and method of operationAPPLIED MATERIALS INC·Filed 2021·Granted Oct 25, 2022·4 cites·20 claims
- 0297US11127557B1Ion source with single-slot tubular cathodeAPPLIED MATERIALS INC·Filed 2020·Granted Sep 21, 2021·5 cites·20 claims
- 0395US11664192B2Temperature control for insertable target holder for solid dopant materialsAPPLIED MATERIALS INC·Filed 2021·Granted May 30, 2023·6 cites·14 claims
- 0495US11170973B2Temperature control for insertable target holder for solid dopant materialsAPPLIED MATERIALS INC·Filed 2020·Granted Nov 9, 2021·8 cites·14 claims
- 0595US7759657B2Methods for implanting B22Hx and its ionized lower mass byproductsAXCELIS TECH INC·Filed 2008·Granted Jul 20, 2010·34 cites·19 claims
- 0693US11569063B2Apparatus, system and method for energy spread ion beamAPPLIED MATERIALS INC·Filed 2021·Granted Jan 31, 2023·2 cites·20 claims
- 0793US9691584B1Ion source for enhanced ionizationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Jun 27, 2017·8 cites·19 claims
- 0892US10957509B1Insertable target holder for improved stability and performance for solid dopant materialsAPPLIED MATERIALS INC·Filed 2019·Granted Mar 23, 2021·8 cites·19 claims
- 0990US11404254B2Insertable target holder for solid dopant materialsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2019·Granted Aug 2, 2022·6 cites·12 claims
- 1089US7589333B2Methods for rapidly switching off an ion beamAXCELIS TECH INC·Filed 2006·Granted Sep 15, 2009·12 cites·19 claims
- 1187US7531819B2Fluorine based cleaning of an ion sourceAXCELIS TECH INC·Filed 2006·Granted May 12, 2009·18 cites·26 claims
- 1286US10290461B1Ion source for enhanced ionizationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted May 14, 2019·3 cites·21 claims
- 1382US10896799B1Ion source with multiple configurationsAPPLIED MATERIALS INC·Filed 2019·Granted Jan 19, 2021·3 cites·20 claims
- 1480US12400828B2Temperature control for insertable target holder for solid dopant materialsAPPLIED MATERIALS INC·Filed 2023·Granted Aug 26, 2025·0 cites·12 claims
- 1580US8193513B2Hybrid ion source/multimode ion sourceDIVERGILIO WILLIAM F·Filed 2008·Granted Jun 5, 2012·8 cites·10 claims
- 1677US2024329006A1Pipeline monitoring apparatus and method of use thereofTIEGER DANIEL R·Filed 2023·Application pending·0 cites
- 1776US8089052B2Ion source with adjustable apertureTIEGER DANIEL·Filed 2009·Granted Jan 3, 2012·6 cites·20 claims
- 1875USD1051838SSingle-slot tubular cathodeAPPLIED MATERIALS INC·Filed 2021·Granted Nov 19, 2024·0 cites·1 claims
- 1974US11631567B2Ion source with single-slot tubular cathodeAPPLIED MATERIALS INC·Filed 2021·Granted Apr 18, 2023·0 cites·18 claims
- 2069US8524584B2Carbon implantation process and carbon ion precursor compositionLEE WILLIAM D·Filed 2011·Granted Sep 3, 2013·2 cites·14 claims
- 2168US10431421B2Apparatus and techniques for beam mapping in ion beam systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Oct 1, 2019·1 cites·8 claims
- 2268US8350236B2Aromatic molecular carbon implantation processesAXCELIS TECH INC·Filed 2010·Granted Jan 8, 2013·2 cites·16 claims
- 2363US10692697B2Apparatus and techniques for decelerated ion beam with no energy contaminationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Jun 23, 2020·0 cites·16 claims
- 2459US10147584B2Apparatus and techniques for decelerated ion beam with no energy contaminationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Dec 4, 2018·0 cites·18 claims
- 2555US8803110B2Methods for beam current modulation by ion source parameter modulationGRAF MICHAEL A·Filed 2006·Granted Aug 12, 2014·1 cites·13 claims
- 2655US2020027698A1Apparatus and techniques for beam mapping in ion beam systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2019·Application pending·0 cites
- 2750US9905396B1Curved post scan electrodeVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Feb 27, 2018·0 cites·17 claims
- 2850US2016175804A1Laser-Induced Borane Production for Ion ImplantationAXCELIS TECH INC·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →