Inventor · disambiguated record
David Trussell
Also filed as: TRUSSELL DAVID · TRUSSELL DAVID D · TRUSSELL DAVID DOUGLAS
19 granted patents·2 pending applications·230 citations·filing 1996–2022
94Inventor score
Top patents by PatentIndex Score
21 records- 0196US7430986B2Plasma confinement ring assemblies having reduced polymer deposition characteristicsLAM RES CORP·Filed 2005·Granted Oct 7, 2008·28 cites·20 claims
- 0294US10403476B2Active showerheadLAM RES CORP·Filed 2016·Granted Sep 3, 2019·9 cites·19 claims
- 0394US9502275B1Service tunnel for use on capital equipment in semiconductor manufacturing and research fabsLAM RES CORP·Filed 2015·Granted Nov 22, 2016·13 cites·17 claims
- 0494US7169256B2Plasma processor with electrode responsive to multiple RF frequenciesLAM RES CORP·Filed 2004·Granted Jan 30, 2007·60 cites·63 claims
- 0592US11393705B2Wafer transport assembly with integrated buffersLAM RES CORP·Filed 2020·Granted Jul 19, 2022·2 cites·16 claims
- 0689US11112773B2Systems for removing and replacing consumable parts from a semiconductor process module in situLAM RES CORP·Filed 2017·Granted Sep 7, 2021·5 cites·18 claims
- 0788US8262922B2Plasma confinement rings having reduced polymer deposition characteristicsDHINDSA RAJINDER·Filed 2008·Granted Sep 11, 2012·8 cites·12 claims
- 0887US10804079B2Active showerheadLAM RES CORP·Filed 2019·Granted Oct 13, 2020·3 cites·18 claims
- 0982US7861667B2Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrodeLAM RES CORP·Filed 2003·Granted Jan 4, 2011·23 cites·31 claims
- 1078US11764086B2Wafer transport assembly with integrated buffersLAM RES CORP·Filed 2022·Granted Sep 19, 2023·0 cites·18 claims
- 1177US10790174B2Wafer transport assembly with integrated buffersLAM RES CORP·Filed 2018·Granted Sep 29, 2020·1 cites·10 claims
- 1276US5911833AMethod of in-situ cleaning of a chuck within a plasma chamberLAM RES CORP·Filed 1997·Granted Jun 15, 1999·49 cites·17 claims
- 1373US5988187AChemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection portsLAM RES CORP·Filed 1996·Granted Nov 23, 1999·22 cites·20 claims
- 1471US8500952B2Plasma confinement rings having reduced polymer deposition characteristicsDHINDSA RAJINDER·Filed 2012·Granted Aug 6, 2013·4 cites·20 claims
- 1570US9929028B2Service tunnel for use on capital equipment in semiconductor manufacturing and research fabsLAM RES CORP·Filed 2016·Granted Mar 27, 2018·1 cites·20 claims
- 1666US8573153B2Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrodeFISCHER ANDREAS·Filed 2010·Granted Nov 5, 2013·1 cites·14 claims
- 1756US2017115657A1Systems for Removing and Replacing Consumable Parts from a Semiconductor Process Module in SituLAM RES CORP·Filed 2015·Application pending·0 cites
- 1855US10014196B2Wafer transport assembly with integrated buffersLAM RES CORP·Filed 2015·Granted Jul 3, 2018·0 cites·6 claims
- 1954USRE38097EChemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection portsLAM RES CORP·Filed 2001·Granted Apr 29, 2003·1 cites·20 claims
- 2045US2016086864A1Movable gas nozzle in drying moduleLAM RES CORP·Filed 2014·Application pending·0 cites
- 2139US10304707B2Load lock interface and integrated post-processing moduleLAM RES CORP·Filed 2015·Granted May 28, 2019·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →