Inventor · disambiguated record
David Ferdinand Vles
Also filed as: VLES DAVID FERDINAND
26 granted patents·3 pending applications·41 citations·filing 2016–2024
94Inventor score
Files withASML NETHERLANDS BV29
Top patents by PatentIndex Score
29 records- 0196US10983431B2Pellicle and pellicle assemblyASML NETHERLANDS BV·Filed 2019·Granted Apr 20, 2021·5 cites·20 claims
- 0293US11971654B2Metal-silicide-nitridation for stress reductionASML NETHERLANDS BV·Filed 2023·Granted Apr 30, 2024·1 cites·20 claims
- 0393US10466585B2Pellicle and pellicle assemblyASML NETHERLANDS BV·Filed 2016·Granted Nov 5, 2019·4 cites·20 claims
- 0492US11287737B2Metal-silicide-nitridation for stress reductionASML NETHERLANDS BV·Filed 2018·Granted Mar 29, 2022·5 cites·20 claims
- 0590US11686997B2Metal-silicide-nitridation for stress reductionASML NETHERLANDS BV·Filed 2022·Granted Jun 27, 2023·1 cites·20 claims
- 0689US11467486B2Graphene pellicle lithographic apparatusASML NETHERLANDS BV·Filed 2019·Granted Oct 11, 2022·4 cites·21 claims
- 0789US10747127B2Lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted Aug 18, 2020·5 cites·26 claims
- 0888US10908496B2Membrane for EUV lithographyASML NETHERLANDS BV·Filed 2017·Granted Feb 2, 2021·3 cites·20 claims
- 0987US11320731B2Membrane for EUV lithographyASML NETHERLANDS BV·Filed 2016·Granted May 3, 2022·3 cites·22 claims
- 1082US12117726B2Pellicle and pellicle assemblyASML NETHERLANDS BV·Filed 2023·Granted Oct 15, 2024·0 cites·20 claims
- 1182US10712656B2Method for manufacturing a membrane assemblyASML NETHERLANDS BV·Filed 2016·Granted Jul 14, 2020·4 cites·21 claims
- 1281US2024302734A1Metal-silicide-nitridation for stress reductionASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1380US12066758B2Pellicle and pellicle assemblyASML NETHERLANDS BV·Filed 2022·Granted Aug 20, 2024·0 cites·20 claims
- 1479US11231646B2Pellicle and pellicle assemblyASML NETHERLANDS BV·Filed 2018·Granted Jan 25, 2022·1 cites·20 claims
- 1579US11042096B2Alignment measurement systemASML NETHERLANDS BV·Filed 2018·Granted Jun 22, 2021·2 cites·21 claims
- 1678US12474629B2Membrane for EUV lithographyASML NETHERLANDS BV·Filed 2023·Granted Nov 18, 2025·0 cites·20 claims
- 1776US11947256B2Simultaneous double-side coating of multilayer graphene pellicle by local thermal processingASML NETHERLANDS BV·Filed 2018·Granted Apr 2, 2024·1 cites·22 claims
- 1876US11347142B2Pellicle and pellicle assemblyASML NETHERLANDS BV·Filed 2021·Granted May 31, 2022·0 cites·20 claims
- 1975US11754918B2Pellicle and pellicle assemblyASML NETHERLANDS BV·Filed 2021·Granted Sep 12, 2023·0 cites·24 claims
- 2074US12032301B2Substrate support, lithographic apparatus and loading methodASML NETHERLANDS BV·Filed 2022·Granted Jul 9, 2024·0 cites·20 claims
- 2174US11314163B2Pellicle frame and pellicle assemblyASML NETHERLANDS BV·Filed 2018·Granted Apr 26, 2022·1 cites·20 claims
- 2272US2023311173A1Membrane cleaning apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2371US12298663B2Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicleASML NETHERLANDS BV·Filed 2016·Granted May 13, 2025·1 cites·20 claims
- 2471US11762281B2Membrane for EUV lithographyASML NETHERLANDS BV·Filed 2020·Granted Sep 19, 2023·0 cites·20 claims
- 2563US2022276553A1Pellicle membrane for a lithographic apparatusASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 2662US11673169B2Membrane cleaning apparatusASML NETHERLANDS BV·Filed 2019·Granted Jun 13, 2023·0 cites·20 claims
- 2754US11556063B2Substrate support, lithographic apparatus and loading methodASML NETHERLANDS BV·Filed 2017·Granted Jan 17, 2023·0 cites·20 claims
- 2850US11036128B2Membrane assemblyASML NETHERLANDS BV·Filed 2016·Granted Jun 15, 2021·0 cites·20 claims
- 2948US10976196B2Sensor mark and a method of manufacturing a sensor markASML NETHERLANDS BV·Filed 2018·Granted Apr 13, 2021·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →