Inventor · disambiguated record
Damon Vincent Williams
Also filed as: WILLIAMS DAMON · WILLIAMS DAMON V · WILLIAMS DAMON VINCENT
12 granted patents·4 pending applications·172 citations·filing 2000–2017
92Inventor score
Top patents by PatentIndex Score
16 records- 0184US6443815B1Apparatus and methods for controlling pad conditioning head tilt for chemical mechanical polishingLAM RES CORP·Filed 2000·Granted Sep 3, 2002·28 cites·21 claims
- 0280US6709322B2Apparatus for aligning a surface of an active retainer ring with a wafer surface for chemical mechanical polishingLAM RES CORP·Filed 2001·Granted Mar 23, 2004·22 cites·17 claims
- 0380US6652357B1Methods for controlling retaining ring and wafer head tilt for chemical mechanical polishingLAM RES CORP·Filed 2000·Granted Nov 25, 2003·22 cites·12 claims
- 0477US6659116B1System for wafer carrier in-process clean and rinseLAM RES CORP·Filed 2002·Granted Dec 9, 2003·20 cites·25 claims
- 0576US6976903B1Apparatus for controlling retaining ring and wafer head tilt for chemical mechanical polishingLAM RES CORP·Filed 2003·Granted Dec 20, 2005·17 cites·11 claims
- 0673US6843707B2Methods for aligning a surface of an active retainer ring with a wafer surface for chemical mechanical polishingLAM RES CORP·Filed 2003·Granted Jan 18, 2005·13 cites·12 claims
- 0770US6937915B1Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and controlLAM RES CORP·Filed 2002·Granted Aug 30, 2005·11 cites·16 claims
- 0867US6925348B2Methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and controlLAM RES CORP·Filed 2004·Granted Aug 2, 2005·9 cites·17 claims
- 0965US7481695B2Polishing apparatus and methods having high processing workload for controlling polishing pressure applied by polishing headLAM RES CORP·Filed 2000·Granted Jan 27, 2009·10 cites·17 claims
- 1062US6640155B2Chemical mechanical polishing apparatus and methods with central control of polishing pressure applied by polishing headLAM RES CORP·Filed 2000·Granted Oct 28, 2003·8 cites·14 claims
- 1158US6719874B1Active retaining ring supportLAM RES CORP·Filed 2001·Granted Apr 13, 2004·7 cites·16 claims
- 1253US6752703B2Chemical mechanical polishing apparatus and methods with porous vacuum chuck and perforated carrier filmLAM RES CORP·Filed 2001·Granted Jun 22, 2004·5 cites·8 claims
- 1336US2004017904A1System and method for validating calls within a telecommunications networkFiled 2002·Application pending·0 cites
- 1434US2004015540A1Modular, extendible application server that is distributed across an electronic data network and method of making sameFiled 2002·Application pending·0 cites
- 1533US2017220026A1Direct contact instrument calibration systemBIO RAD LABORATORIES INC·Filed 2017·Application pending·0 cites
- 1632US2003055877A1Remote client manager that facilitates an extendible, modular application server system distributed via an electronic data network and method of distributing sameFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →