Inventor · disambiguated record
Dean R. Denison
Also filed as: DENISON DEAN · DENISON DEAN R
11 granted patents·589 citations·filing 1976–1999
93Inventor score
Top patents by PatentIndex Score
11 records- 0196US5200232AReaction chamber design and method to minimize particle generation in chemical vapor deposition reactorsLAM RES CORP·Filed 1990·Granted Apr 6, 1993·132 cites·12 claims
- 0292US5750211AProcess for depositing a SiOx film having reduced intrinsic stress and/or reduced hydrogen contentLAM RES CORP·Filed 1993·Granted May 12, 1998·94 cites·29 claims
- 0391US4101874AFluid flow indicator and flow switchPERKIN ELMER CORP·Filed 1976·Granted Jul 18, 1978·49 cites·5 claims
- 0483US5869149AMethod for preparing nitrogen surface treated fluorine doped silicon dioxide filmsLAM RES CORP·Filed 1997·Granted Feb 9, 1999·66 cites·17 claims
- 0583US5503676AApparatus and method for magnetron in-situ cleaning of plasma reaction chamberLAM RES CORP·Filed 1995·Granted Apr 2, 1996·81 cites·24 claims
- 0676US5911833AMethod of in-situ cleaning of a chuck within a plasma chamberLAM RES CORP·Filed 1997·Granted Jun 15, 1999·49 cites·17 claims
- 0774US6042901AMethod for depositing fluorine doped silicon dioxide filmsLAM RES CORP·Filed 1996·Granted Mar 28, 2000·45 cites·16 claims
- 0871US6326064B1Process for depositing a SiOx film having reduced intrinsic stress and/or reduced hydrogen contentLAM RES CORP·Filed 1999·Granted Dec 4, 2001·31 cites·35 claims
- 0968US5368646AReaction chamber design to minimize particle generation in chemical vapor deposition reactorsLAM RES CORP·Filed 1994·Granted Nov 29, 1994·23 cites·28 claims
- 1046US5841623AChuck for substrate processing and method for depositing a film in a radio frequency biased plasma chemical depositing systemLAM RES CORP·Filed 1995·Granted Nov 24, 1998·13 cites·14 claims
- 1137US5897711AMethod and apparatus for improving refractive index of dielectric filmsLAM RES CORP·Filed 1995·Granted Apr 27, 1999·6 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →