Inventor · disambiguated record
Demetre J. Economou
Also filed as: ECONOMOU DEMETRE J
9 granted patents·1 pending application·83 citations·filing 1988–2018
86Inventor score
Top patents by PatentIndex Score
10 records- 0190US8968588B2Low electron temperature microwave surface-wave plasma (SWP) processing method and apparatusZHAO JIANPING·Filed 2012·Granted Mar 3, 2015·23 cites·13 claims
- 0288US10515782B2Atomic layer etching with pulsed plasmasUNIV HOUSTON SYSTEM·Filed 2018·Granted Dec 24, 2019·4 cites·15 claims
- 0388US4859277AMethod for measuring plasma properties in semiconductor processingTEXAS INSTRUMENTS INC·Filed 1988·Granted Aug 22, 1989·43 cites·32 claims
- 0485US7883839B2Method and apparatus for nano-pantographyUNIV HOUSTON·Filed 2006·Granted Feb 8, 2011·6 cites·21 claims
- 0571US8030620B2System and method for nano-pantographyUNIV HOUSTON·Filed 2009·Granted Oct 4, 2011·1 cites·19 claims
- 0670US7358484B2Hyperthermal neutral beam source and method of operatingTOKYO ELECTRON LTD·Filed 2005·Granted Apr 15, 2008·5 cites·22 claims
- 0757US7638759B2Hyperthermal neutral beam source and method of operatingTOKYO ELECTRON LTD·Filed 2008·Granted Dec 29, 2009·1 cites·18 claims
- 0846US2011139748A1Atomic layer etching with pulsed plasmasUNIV HOUSTON·Filed 2010·Application pending·0 cites
- 0940US10207469B2Systems and methods for rapidly fabricating nanopatterns in a parallel fashion over large areasUNIV HOUSTON SYSTEM·Filed 2015·Granted Feb 19, 2019·0 cites·23 claims
- 1038US9852893B2Dipole ring magnet assisted microwave radial line slot antenna plasma processing method and apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Dec 26, 2017·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →