Inventor · disambiguated record
Deven Raj Mittal
Also filed as: MITTAL DEVEN · Mittal Deven Raj
6 granted patents·5 pending applications·2 citations·filing 2015–2024
68Inventor score
Top patents by PatentIndex Score
11 records- 0170US11127601B2Phosphorus fugitive emission controlAPPLIED MATERIALS INC·Filed 2019·Granted Sep 21, 2021·1 cites·10 claims
- 0265US11545368B2Phosphorus fugitive emission controlAPPLIED MATERIALS INC·Filed 2021·Granted Jan 3, 2023·0 cites·8 claims
- 0363US10515802B2Techniques for forming low stress mask using implantationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Dec 24, 2019·1 cites·17 claims
- 0461US2025338641A1Deep trench sidewall passivation using conformal plasma doping and low-temperature thermal treatmentsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0559US2025372379A1Hard mask stress modulation using low energy implantAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0657US2025112043A1LOW ENERGY TREATMENT TO PASSIVATE SiC SUBSTRATE DEFECTSAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0756US2025385083A1Methods and system for duty factor ramped timed ion implant matchingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0854US11756796B2Techniques for improved low dielectric constant film processingAPPLIED MATERIALS INC·Filed 2021·Granted Sep 12, 2023·0 cites·19 claims
- 0952US2024006158A1Co-doping to control wet etch rate of fcvd oxide layersAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1050US11501972B2Sacrificial capping layer for passivation using plasma-based implant processAPPLIED MATERIALS INC·Filed 2020·Granted Nov 15, 2022·0 cites·24 claims
- 1142US9437432B1Self-compensating oxide layerVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Sep 6, 2016·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →