Inventor · disambiguated record
Dennis C. Swartz
Also filed as: SWARTZ DENNIS C
5 granted patents·84 citations·filing 1994–2000
80Inventor score
Top patents by PatentIndex Score
5 records- 0177US5782980ALow pressure chemical vapor deposition apparatus including a process gas heating subsystemADVANCED MICRO DEVICES INC·Filed 1996·Granted Jul 21, 1998·53 cites·19 claims
- 0267US6589350B1Vacuum processing chamber with controlled gas supply valveADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 8, 2003·10 cites·25 claims
- 0341US6270580B2Modified material deposition sequence for reduced detect densities in semiconductor manufacturingADVANCED MICRO DEVICES INC·Filed 1999·Granted Aug 7, 2001·10 cites·10 claims
- 0435US5528226AApparatus and method for controlling the burn-off operation of a gas in a semiconductor wafer fabrication furnaceADVANCED MICRO DEVICES INC·Filed 1994·Granted Jun 18, 1996·6 cites·4 claims
- 0528US6814837B1Controlled gas supply line apparatus and process for infilm and onfilm defect reductionADVANCE MICRO DEVICES INC·Filed 1998·Granted Nov 9, 2004·5 cites·29 claims
Join the waitlist — get patent alerts
Get an alert when Dennis C. Swartz files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →