Inventor · disambiguated record
Dieter Bader
Also filed as: BADER DIETER
9 granted patents·8 pending applications·33 citations·filing 1998–2024
79Inventor score
Files withZEISS CARL SMT AG7ZEISS CARL SMT GMBH4BERNDORF BAND GMBH2BADER DIETER1BERNDORF BAND GMBH & CO1
Top patents by PatentIndex Score
17 records- 0168US7511890B2Refractive optical imaging system, in particular projection objective for microlithographyZEISS CARL SMT AG·Filed 2006·Granted Mar 31, 2009·2 cites·19 claims
- 0267US6256087B1Light intensity measurement systemZEISS STIFTUNG·Filed 1998·Granted Jul 3, 2001·30 cites·7 claims
- 0365US2025130504A1Optical element and projection exposure apparatus for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0462US11740562B2Sealing device, component and lithography apparatusZEISS CARL SMT GMBH·Filed 2021·Granted Aug 29, 2023·0 cites·22 claims
- 0557US12397510B2Method and device for producing an adhesive bond between a first component and a second componentZEISS CARL SMT GMBH·Filed 2021·Granted Aug 26, 2025·0 cites·16 claims
- 0655US2024085800A1Projection exposure apparatus and method for designing a component of a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 0745US11915864B2Magnetic retaining deviceBERNDORF BAND GMBH·Filed 2018·Granted Feb 27, 2024·0 cites·28 claims
- 0845US2008225387A1COLLECTOR FOR ILLUMINATION SYSTEMS WITH A WAVELENGTH LESS THAN OR EQUAL TO 193 nmZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 0943US8064040B2Projection objective, projection exposure apparatus and reflective reticle for microlithographyDODOC AURELIAN·Filed 2005·Granted Nov 22, 2011·0 cites·34 claims
- 1042US7371430B2Method for structuring endless belts for pressesBERNDORF BAND GMBH & CO·Filed 2002·Granted May 13, 2008·1 cites·11 claims
- 1142US2008212045A1optical system with at least a semiconductor light source and a method for removing contaminations and/or heating the systemsZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1241US9751359B2Method for structuring a press beltBERNDORF BAND GMBH·Filed 2013·Granted Sep 5, 2017·0 cites·4 claims
- 1341US2005117203A1Method for producing an optical element from a quartz substrateZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 1441US2008111983A1Illumination System for a Microlithographic Projection Exposure ApparatusZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 1540US2004021843A1Method for producing an optical element from a quartz substrateZEISS CARL SMT AG·Filed 2003·Application pending·0 cites
- 1635US2005226000A1Optical apparatus for illuminating an objectZEISS CARL SMT AG·Filed 2004·Application pending·0 cites
- 1732US9091936B2Illumination system of a microlithographic projection exposure apparatusBADER DIETER·Filed 2011·Granted Jul 28, 2015·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →