Inventor · disambiguated record
Dirk De Vries
Also filed as: DE VRIES DIRK · DE VRIES DIRK KENNETH
9 granted patents·1 pending application·44 citations·filing 1979–2016
84Inventor score
Files withDE VRIES DIRK KENNETH2VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS2ASML NETHERLANDS BV1DE VRIES DIRK1GROUWSTRA CÉDRIC DÉSIRÉ1
Top patents by PatentIndex Score
10 records- 0186US9329491B2Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatusGROUWSTRA CÉDRIC DÉSIRÉ·Filed 2011·Granted May 3, 2016·7 cites·21 claims
- 0286US8114568B2Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatusVAN DER HEIJDEN MARCUS THEODOOR WILHELMUS·Filed 2008·Granted Feb 14, 2012·12 cites·31 claims
- 0383US8264235B2Test structure for detection of defect devices with lowered resistanceDE VRIES DIRK KENNETH·Filed 2007·Granted Sep 11, 2012·16 cites·17 claims
- 0463US7688083B2Analogue measurement of alignment between layers of a semiconductor deviceNXP BV·Filed 2005·Granted Mar 30, 2010·4 cites·18 claims
- 0555US9964865B2Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted May 8, 2018·0 cites·20 claims
- 0650US8394572B2Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatusVAN DER HEIJDEN MARCUS THEODOOR WILHELMUS·Filed 2012·Granted Mar 12, 2013·0 cites·20 claims
- 0737US8129097B2Immersion lithographyDE VRIES DIRK·Filed 2008·Granted Mar 6, 2012·0 cites·18 claims
- 0834US4301759AControl system, particularly for use on shipsSTORK KWANT BV·Filed 1979·Granted Nov 24, 1981·5 cites·8 claims
- 0932US8856084B2Data processing method and deviceDE VRIES DIRK KENNETH·Filed 2012·Granted Oct 7, 2014·0 cites·10 claims
- 1032US2012316803A1Semiconductor test data analysis systemSIMON PAUL·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →