Inventor · disambiguated record
Diana Franz
Also filed as: FRANZ DIANA
6 granted patents·6 pending applications·1 citations·filing 2008–2018
67Inventor score
Top patents by PatentIndex Score
12 records- 0172US10219515B2Agrochemical adjuvant containing 2-oxo-1,3-dioxolan-4 carboxylatesBASF SE·Filed 2015·Granted Mar 5, 2019·1 cites·12 claims
- 0258US11019816B2Composition comprising cinmethylin-containing microparticles and a further herbicideBASF AGRO BV·Filed 2018·Granted Jun 1, 2021·0 cites·14 claims
- 0355US12376586B2Microcapsules comprising cinmethyln in the core and a polyurea derived from diphenylmethane diisocyanate or an oligomer thereofBASF AGRO BV·Filed 2018·Granted Aug 5, 2025·0 cites·17 claims
- 0452US2010130385A1Production and use of paraffin inhibitor formulationsBASF SE·Filed 2008·Application pending·0 cites
- 0547US2019343121A1Cinmethylin Microcapsules with a Shell Made of Tetramethylxylylene Diisocyanate and a Polyamine with at Least Three Amine GroupsBASF AGRO BV·Filed 2017·Application pending·0 cites
- 0647US2019350197A1Composition comprising polyurethane microcapsules comprising cinmethylinBASF AGRO BV·Filed 2017·Application pending·0 cites
- 0741US9416298B2Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (CMP) of III-V material in the presence of a CMP composition comprising a specific non-ionic surfactantBASF SE·Filed 2013·Granted Aug 16, 2016·0 cites·12 claims
- 0838US9263296B2Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitorsNOLLER BASTIAN·Filed 2012·Granted Feb 16, 2016·0 cites·25 claims
- 0937US2015099361A1Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (cmp) of iii-v material in the presence of a cmp composition comprising a compound containing an n-heterocycleBASF SE·Filed 2013·Application pending·0 cites
- 1035US10407594B2Chemical mechanical polishing (CMP) composition comprising a polymeric polyamineNOLLER BASTIAN MARTEN·Filed 2012·Granted Sep 10, 2019·0 cites·12 claims
- 1131US2013200039A1Aqueous polishing compositions containing n-substituted diazenium dioxides and/or n'-hydroxy-diazenium oxide saltsNOLLER BASTIAN·Filed 2011·Application pending·0 cites
- 1230US2012083188A1Dispersion comprising cerium oxide and silicon dioxideKROELL MICHAEL·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →