Inventor · disambiguated record
Dirk Hellweg
Also filed as: HELLWEG DIRK
16 granted patents·3 pending applications·19 citations·filing 2008–2023
87Inventor score
Top patents by PatentIndex Score
19 records- 0193US8325322B2Optical correction deviceHAUF MARKUS·Filed 2010·Granted Dec 4, 2012·16 cites·20 claims
- 0277US10761420B2Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a methodZEISS CARL SMT GMBH·Filed 2018·Granted Sep 1, 2020·1 cites·20 claims
- 0371US12353141B2Method for heating an optical element in a microlithographic projection exposure apparatus and optical systemZEISS CARL SMT GMBH·Filed 2023·Granted Jul 8, 2025·0 cites·20 claims
- 0471US9081294B2Method for measuring an angularly resolved intensity distribution and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Jul 14, 2015·1 cites·12 claims
- 0567US11256178B2Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a methodZEISS CARL SMT GMBH·Filed 2020·Granted Feb 22, 2022·0 cites·20 claims
- 0665US8659745B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsZEISS CARL SMT GMBH·Filed 2013·Granted Feb 25, 2014·1 cites·32 claims
- 0759US12422743B2Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the methodZEISS CARL SMT GMBH·Filed 2022·Granted Sep 23, 2025·0 cites·18 claims
- 0859US2018299787A1Method for measuring an angularly resolved intensity distribution and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 0958US11460785B2Method for the qualification of a mask for microlithographyZEISS CARL SMT GMBH·Filed 2020·Granted Oct 4, 2022·0 cites·24 claims
- 1055US9915871B2Method for measuring an angularly resolved intensity distribution and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Mar 13, 2018·0 cites·16 claims
- 1150US10564551B2Method for determining a focus position of a lithography mask and metrology system for carrying out such a methodZEISS CARL SMT GMBH·Filed 2019·Granted Feb 18, 2020·0 cites·19 claims
- 1249US9785052B2Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errorsZEISS CARL SMT GMBH·Filed 2013·Granted Oct 10, 2017·0 cites·20 claims
- 1349US2022057709A1Method for approximating imaging properties of an optical production system to those of an optical measurement system, and metrology system to this endZEISS CARL SMT GMBH·Filed 2021·Application pending·0 cites
- 1447US10948637B2Metrology system having an EUV optical unitZEISS CARL SMT GMBH·Filed 2018·Granted Mar 16, 2021·0 cites·20 claims
- 1546US10481505B2Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masksZEISS CARL SMT GMBH·Filed 2019·Granted Nov 19, 2019·0 cites·20 claims
- 1646US2008316455A1Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1745US11061331B2Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidthZEISS CARL SMT GMBH·Filed 2019·Granted Jul 13, 2021·0 cites·10 claims
- 1845US10775691B2Method for examining photolithographic masks and mask metrology apparatus for performing the methodZEISS CARL SMT GMBH·Filed 2018·Granted Sep 15, 2020·0 cites·20 claims
- 1945US8542346B2Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrationsLIMBACH GUIDO·Filed 2009·Granted Sep 24, 2013·0 cites·33 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →