Inventor · disambiguated record
Dirk Seidel
Also filed as: SEIDEL DIRK
21 granted patents·6 pending applications·33 citations·filing 2010–2025
91Inventor score
Files withZEISS CARL SMT GMBH20ARNZ MICHAEL2PERLITZ SASCHA1SEIDEL DIRK1ZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH1
Top patents by PatentIndex Score
27 records- 0192US10108085B2Method for localizing defects on substratesZEISS CARL SMT GMBH·Filed 2017·Granted Oct 23, 2018·13 cites·20 claims
- 0286US11892769B2Method for detecting an object structure and apparatus for carrying out the methodZEISS CARL SMT GMBH·Filed 2020·Granted Feb 6, 2024·2 cites·23 claims
- 0386US11774859B2Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography processZEISS CARL SMT GMBH·Filed 2020·Granted Oct 3, 2023·2 cites·20 claims
- 0479US2024264536A1Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation modelZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0577US12001145B2Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation modelZEISS CARL SMT GMBH·Filed 2019·Granted Jun 4, 2024·1 cites·22 claims
- 0677US10585274B2Method for capturing and compensating ambient effects in a measuring microscopeZEISS CARL SMT GMBH·Filed 2018·Granted Mar 10, 2020·2 cites·22 claims
- 0775US12111579B2Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography processZEISS CARL SMT GMBH·Filed 2023·Granted Oct 8, 2024·0 cites·26 claims
- 0874US8694929B2Method and apparatus for the position determination of structures on a mask for microlithographySEIDEL DIRK·Filed 2012·Granted Apr 8, 2014·6 cites·16 claims
- 0973US10089733B2Method for determining a position of a structure element on a mask and microscope for carrying out the methodZEISS CARL SMT GMBH·Filed 2016·Granted Oct 2, 2018·2 cites·27 claims
- 1068US9297994B2Grating-assisted autofocus device and autofocusing method for an imaging devicePERLITZ SASCHA·Filed 2012·Granted Mar 29, 2016·3 cites·31 claims
- 1163US8693805B2Determination of the relative position of two structuresARNZ MICHAEL·Filed 2010·Granted Apr 8, 2014·1 cites·21 claims
- 1261US2025315940A1Computer implemented method, computer-readable medium, computer program product and corresponding systems for the prediction of defects in wafers and for offline wafer-less process window qualificationZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1360US9786046B2Method and device for determining a lateral offset of a pattern on a substrate relative to a desired positionZEISS CARL SMT GMBH·Filed 2015·Granted Oct 10, 2017·1 cites·20 claims
- 1460US2023393488A1Method for registering structures on microlithographic masks, computer program product and microlithographic methodZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1558US11947185B2Autofocusing method for an imaging deviceZEISS CARL SMT GMBH·Filed 2021·Granted Apr 2, 2024·0 cites·20 claims
- 1657US2024133805A1Method for determining the phase and/or refractive index of a region of an object, and microscope for determining the phase and/or refractive index of a region of an objectZEISS CARL MICROSCOPY GMBH·Filed 2023·Application pending·0 cites
- 1756US2025152000A1Wide-field swept-source oct and method for moving objectsZEISS CARL MEDITEC AG·Filed 2022·Application pending·0 cites
- 1854US11243392B2Method for determining an imaging function of a mask inspection microscope, and mask inspection microscopeZEISS CARL SMT GMBH·Filed 2020·Granted Feb 8, 2022·0 cites·19 claims
- 1954US10113864B2Method for determining the registration of a structure on a photomask and apparatus to perform the methodZEISS CARL SMT GMBH·Filed 2016·Granted Oct 30, 2018·0 cites·20 claims
- 2051US12307334B2Method and device for evaluating a statistically distributed measured value in the examination of an element of a photolithography processZEISS CARL SMT GMBH·Filed 2021·Granted May 20, 2025·0 cites·25 claims
- 2151US9303975B2Method for determining the registration of a structure on a photomask and apparatus to perform the methodARNZ MICHAEL·Filed 2011·Granted Apr 5, 2016·0 cites·46 claims
- 2247US2024029216A1Measurement Techniques for Correcting Images with Extended Depth of FieldZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH·Filed 2023·Application pending·0 cites
- 2345US10599936B2Method for correcting the distortion of a first imaging optical unit of a first measurement systemZEISS CARL SMT GMBH·Filed 2018·Granted Mar 24, 2020·0 cites·20 claims
- 2444US11631168B2Method, computer program and apparatus for determining a quality of a mask of a photolithography apparatusZEISS CARL SMT GMBH·Filed 2020·Granted Apr 18, 2023·0 cites·16 claims
- 2536US9785058B2Method for ascertaining distortion properties of an optical system in a measurement system for microlithographyZEISS CARL SMT GMBH·Filed 2015·Granted Oct 10, 2017·0 cites·10 claims
- 2631US10380733B2Method and apparatus for determining the position of structure elements of a photolithographic maskZEISS CARL SMT GMBH·Filed 2016·Granted Aug 13, 2019·0 cites·24 claims
- 2727US11079586B2Measuring microscope for measuring masks for lithographic methods and measuring method and calibration method thereforZEISS CARL SMT GMBH·Filed 2017·Granted Aug 3, 2021·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →