Inventor · disambiguated record
Dmitry A. Dzilno
Also filed as: DZILNO DMITRY A
37 granted patents·9 pending applications·47 citations·filing 2011–2025
96Inventor score
Top patents by PatentIndex Score
46 records- 0196US11956883B2Methods and apparatus for controlling RF parameters at multiple frequenciesAPPLIED MATERIALS INC·Filed 2022·Granted Apr 9, 2024·3 cites·18 claims
- 0294US11570879B2Methods and apparatus for controlling RF parameters at multiple frequenciesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 31, 2023·3 cites·18 claims
- 0392US11587817B2High temperature bipolar electrostatic chuckAPPLIED MATERIALS INC·Filed 2020·Granted Feb 21, 2023·2 cites·20 claims
- 0491US10763085B2Shaped electrodes for improved plasma exposure from vertical plasma sourceAPPLIED MATERIALS INC·Filed 2018·Granted Sep 1, 2020·5 cites·20 claims
- 0590US11776793B2Plasma source with ceramic electrode plateAPPLIED MATERIALS INC·Filed 2020·Granted Oct 3, 2023·2 cites·20 claims
- 0690US11705312B2Vertically adjustable plasma sourceAPPLIED MATERIALS INC·Filed 2020·Granted Jul 18, 2023·2 cites·13 claims
- 0785US12057339B2Bipolar electrostatic chuck to limit DC dischargeAPPLIED MATERIALS INC·Filed 2020·Granted Aug 6, 2024·1 cites·7 claims
- 0885US11594440B2Real time bias detection and correction for electrostatic chuckAPPLIED MATERIALS INC·Filed 2020·Granted Feb 28, 2023·1 cites·13 claims
- 0985US10720311B2Phased array modular high-frequency sourceAPPLIED MATERIALS INC·Filed 2019·Granted Jul 21, 2020·2 cites·20 claims
- 1085US8880210B2Methods and apparatus for processing substrates using model-based controlPORTHOUSE KEITH BRIAN·Filed 2011·Granted Nov 4, 2014·9 cites·21 claims
- 1184US11114282B2Phased array modular high-frequency sourceAPPLIED MATERIALS INC·Filed 2020·Granted Sep 7, 2021·1 cites·20 claims
- 1284US10504699B2Phased array modular high-frequency sourceAPPLIED MATERIALS INC·Filed 2018·Granted Dec 10, 2019·3 cites·20 claims
- 1381US12288677B2Vertically adjustable plasma sourceAPPLIED MATERIALS INC·Filed 2023·Granted Apr 29, 2025·0 cites·20 claims
- 1481US11430680B2Position and temperature monitoring of ALD platen susceptorAPPLIED MATERIALS INC·Filed 2019·Granted Aug 30, 2022·2 cites·12 claims
- 1581US10312120B2Position and temperature monitoring of ALD platen susceptorAPPLIED MATERIALS INC·Filed 2014·Granted Jun 4, 2019·4 cites·18 claims
- 1679US11823871B2Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing toolAPPLIED MATERIALS INC·Filed 2019·Granted Nov 21, 2023·2 cites·20 claims
- 1779US11081318B2Geometrically selective deposition of dielectric films utilizing low frequency biasAPPLIED MATERIALS INC·Filed 2018·Granted Aug 3, 2021·2 cites·20 claims
- 1879US2025232964A1Vertically adjustable plasma sourceAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1976US2025014934A1Bipolar electrostatic chuck to limit dc dischargeAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2075US11901209B2High temperature bipolar electrostatic chuckAPPLIED MATERIALS INC·Filed 2023·Granted Feb 13, 2024·0 cites·12 claims
- 2174US12080584B2Real time bias detection and correction for electrostatic chuckAPPLIED MATERIALS INC·Filed 2023·Granted Sep 3, 2024·0 cites·19 claims
- 2271US11923172B2Paired dynamic parallel plate capacitively coupled plasmasAPPLIED MATERIALS INC·Filed 2022·Granted Mar 5, 2024·0 cites·17 claims
- 2370US9631919B2Non-contact sheet resistance measurement of barrier and/or seed layers prior to electroplatingAPPLIED MATERIALS INC·Filed 2013·Granted Apr 25, 2017·1 cites·10 claims
- 2468US11315763B2Shaped electrodes for improved plasma exposure from vertical plasma sourceAPPLIED MATERIALS INC·Filed 2020·Granted Apr 26, 2022·0 cites·17 claims
- 2565US9335151B2Film measurementAPPLIED MATERIALS INC·Filed 2012·Granted May 10, 2016·2 cites·42 claims
- 2662US11282676B2Paired dynamic parallel plate capacitively coupled plasmasAPPLIED MATERIALS INC·Filed 2019·Granted Mar 22, 2022·0 cites·19 claims
- 2761US11631583B2RF power source operation in plasma enhanced processesAPPLIED MATERIALS INC·Filed 2020·Granted Apr 18, 2023·0 cites·17 claims
- 2861US2025308967A1Chucking sensor using floating esc power suppliesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2960US12224156B2Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing toolAPPLIED MATERIALS INC·Filed 2021·Granted Feb 11, 2025·0 cites·20 claims
- 3060US2025246470A1Semiconductor substrate chucking sensorAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3159US2025285902A1Arc current reduction from an electrostatic chuckAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3258US2025308968A1Arc reduction using unreferenced floating power suppliesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3357US10234261B2Fast and continuous eddy-current metrology of a conductive filmAPPLIED MATERIALS INC·Filed 2013·Granted Mar 19, 2019·0 cites·11 claims
- 3457US2017226655A1Non-Contact Sheet Resistance Measurement of Barrier and/or Seed Layers Prior to ElectroplatingAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 3555US2024249924A1Bipolar electrostatic chuck electrode designsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3653US12317378B2Multi-zone heater control for wafer processing equipmentAPPLIED MATERIALS INC·Filed 2021·Granted May 27, 2025·0 cites·20 claims
- 3753US12094748B2Bipolar esc with balanced RF impedanceAPPLIED MATERIALS INC·Filed 2021·Granted Sep 17, 2024·0 cites·19 claims
- 3853US12040210B2Multi-pressure bipolar electrostatic chuckingAPPLIED MATERIALS INC·Filed 2020·Granted Jul 16, 2024·0 cites·20 claims
- 3952US11776835B2Power supply signal conditioning for an electrostatic chuckAPPLIED MATERIALS INC·Filed 2020·Granted Oct 3, 2023·0 cites·20 claims
- 4051US12394604B2Plasma source with floating electrodesAPPLIED MATERIALS INC·Filed 2020·Granted Aug 19, 2025·0 cites·18 claims
- 4150US12198908B2Magnetically coupled RF filter for substrate processing chambersAPPLIED MATERIALS INC·Filed 2021·Granted Jan 14, 2025·0 cites·7 claims
- 4250US10854428B2Spatial atomic layer deposition chamber with plasma pulsing to prevent charge damageAPPLIED MATERIALS INC·Filed 2018·Granted Dec 1, 2020·0 cites·17 claims
- 4350US2019311886A1Microwave Plasma Source With Split WindowAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4442US9986598B2Temperature control apparatus including groove-routed optical fiber heating, substrate temperature control systems, electronic device processing systems, and processing methodsAPPLIED MATERIALS INC·Filed 2015·Granted May 29, 2018·0 cites·20 claims
- 4539US11626853B2RF power delivery architecture with switchable match and frequency tuningAPPLIED MATERIALS INC·Filed 2021·Granted Apr 11, 2023·0 cites·16 claims
- 4628USD938373SSubstrate transfer structureAPPLIED MATERIALS INC·Filed 2019·Granted Dec 14, 2021·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →