Inventor · disambiguated record
Dougyong Sung
Also filed as: SUNG DOUGYONG
24 granted patents·22 pending applications·70 citations·filing 2004–2025
94Inventor score
Top patents by PatentIndex Score
46 records- 0196US11075089B2Method of plasma etching and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jul 27, 2021·4 cites·20 claims
- 0296US11075088B2Method of plasma etching and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jul 27, 2021·4 cites·20 claims
- 0394US10934621B2Gas injection module, substrate processing apparatus, and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Mar 2, 2021·14 cites·12 claims
- 0493US11545341B2Plasma etching method and semiconductor device fabrication method including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jan 3, 2023·4 cites·20 claims
- 0590US10522374B2Electrostatic chuck, substrate processing apparatus, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Dec 31, 2019·7 cites·12 claims
- 0689US11605529B2Plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Mar 14, 2023·3 cites·19 claims
- 0787US10622217B2Method of plasma etching and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Apr 14, 2020·4 cites·9 claims
- 0886US10224228B2Electrostatic chucks and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Mar 5, 2019·4 cites·17 claims
- 0984US10854485B2Electrostatic chuck, substrate processing apparatus, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Dec 1, 2020·3 cites·5 claims
- 1079US11282679B2Plasma control apparatus and plasma processing system including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Mar 22, 2022·2 cites·20 claims
- 1176US10971333B2Antennas, circuits for generating plasma, plasma processing apparatus, and methods of manufacturing semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Apr 6, 2021·2 cites·17 claims
- 1274US10896838B2Electrostatic chucks and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jan 19, 2021·1 cites·19 claims
- 1371US10892145B2Substrate processing apparatus, substrate processing method, and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jan 12, 2021·1 cites·18 claims
- 1471US7442114B2Methods for silicon electrode assembly etch rate and etch uniformity recoveryLAM RES CORP·Filed 2004·Granted Oct 28, 2008·14 cites·19 claims
- 1570US9691618B2Methods of fabricating semiconductor devices including performing an atomic layer etching processSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jun 27, 2017·2 cites·13 claims
- 1669US12020903B2Plasma etching method and semiconductor device fabrication method including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jun 25, 2024·0 cites·10 claims
- 1764US9355857B2Substrate manufacturing method and substrate manufacturing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted May 31, 2016·1 cites·14 claims
- 1863US12444590B2Plasma sensor moduleSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Oct 14, 2025·0 cites·20 claims
- 1960US11384433B2Gas injection module, substrate processing apparatus, and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jul 12, 2022·0 cites·20 claims
- 2060US2025259817A1Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 2160US2024234093A1Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 2259US12327709B2Antennas, circuits for generating plasma, plasma processing apparatus, and methods of manufacturing semiconductor devices using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jun 10, 2025·0 cites·20 claims
- 2359US2025014871A1Semiconductor processing apparatus using plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2458US2025149311A1Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2558US2025218752A1Substrate processing apparatus, substate processing method using the same, and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2657US12210045B2Impedance measurement jig and method of controlling a substrate-processing apparatus using the jigSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jan 28, 2025·0 cites·16 claims
- 2757US2025085445A1Plasma light detection system including a scintillating windowSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2856US2025046587A1Plasma diagnostic device, and semiconductor processing equipment using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2954US2023402258A1Plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 3054US2023317418A1Substrate processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 3153US2024392426A1Method of surface treatmentSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 3252US2024274418A1Plasma density measurement sensor, apparatus for measuring real-time plasma density having the same, and operating method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 3351US11658039B2Plasma etching apparatus, plasma etching method, and semiconductor device fabrication method including the plasma etching methodSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted May 23, 2023·0 cites·10 claims
- 3450US2023078095A1Plasma etching apparatus and semiconductor processing systemSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 3549US2023100582A1Substrate processing apparatus including plurality of electrodesSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 3649US2023187178A1Gas supply module and substrate processing apparatus using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 3746US11948777B2Method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Apr 2, 2024·0 cites·19 claims
- 3845US2016203996A1Substrate manufacturing method and substrate manufacturing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 3943US11251022B2Gas supply assembly and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Feb 15, 2022·0 cites·17 claims
- 4038US2018182600A1Plasma system and method of fabricating a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Application pending·0 cites
- 4136US2018114700A1Method of atomic layer etching and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Application pending·0 cites
- 4236US2018174802A1Dielectric window, plasma system therewith, method of fabricating dielectric window and method of manufacturing semiconductor device using the plasma systemSAMSUNG ELECTRONICS CO LTD·Filed 2017·Application pending·0 cites
- 4334US2016307740A1Substrate Processing System and Ceramic Coating Method ThereforSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 4434US2016379802A1Apparatus for monitoring vacuum ultraviolet and plasma process equipment including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 4532US2017186586A1Plasma system, plasma processing method, and plasma etching methodSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 4630US2016343547A1Substrate-processing system and method of coating carbon-protection layer thereforSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →