Inventor · disambiguated record
Edward W. Budiarto
Also filed as: BUDIARTO EDWARD · BUDIARTO EDWARD W · BUDIARTO EDWARD WIBOWO
28 granted patents·7 pending applications·123 citations·filing 2003–2024
95Inventor score
Files withAPPLIED MATERIALS INC31APPLIED MATERIALS ISRAEL LTD1APPLIED MATERIALS ITALIA SRL1GENIO EDGAR1RAVID ABRAHAM1
Top patents by PatentIndex Score
35 records- 0197US9157730B2PECVD processAPPLIED MATERIALS INC·Filed 2013·Granted Oct 13, 2015·49 cites·18 claims
- 0296US9458537B2PECVD processAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·12 cites·20 claims
- 0395US9816187B2PECVD processAPPLIED MATERIALS INC·Filed 2016·Granted Nov 14, 2017·8 cites·20 claims
- 0493US11613812B2PECVD processAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·20 claims
- 0590US10793954B2PECVD processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 6, 2020·3 cites·13 claims
- 0690US10060032B2PECVD processAPPLIED MATERIALS INC·Filed 2017·Granted Aug 28, 2018·3 cites·20 claims
- 0788US10886155B2Optical stack deposition and on-board metrologyAPPLIED MATERIALS INC·Filed 2019·Granted Jan 5, 2021·7 cites·20 claims
- 0887US9870935B2Monitoring system for deposition and method of operation thereofAPPLIED MATERIALS INC·Filed 2015·Granted Jan 16, 2018·4 cites·7 claims
- 0985US11898249B2PECVD processAPPLIED MATERIALS INC·Filed 2023·Granted Feb 13, 2024·0 cites·17 claims
- 1079US10281261B2In-situ metrology method for thickness measurement during PECVD processesAPPLIED MATERIALS INC·Filed 2016·Granted May 7, 2019·2 cites·16 claims
- 1176US12492890B2In-situ reflectometry for real-time process controlAPPLIED MATERIALS INC·Filed 2023·Granted Dec 9, 2025·0 cites·19 claims
- 1276US10260855B2Electroplating tool with feedback of metal thickness distribution and correctionAPPLIED MATERIALS INC·Filed 2013·Granted Apr 16, 2019·2 cites·9 claims
- 1376US2023213444A1Methods and systems to measure properties of moving products in device manufacturing machinesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1476US2025125171A1Spatial pattern loading measurement with imaging metrologyAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1573US10030306B2PECVD apparatus and processAPPLIED MATERIALS INC·Filed 2013·Granted Jul 24, 2018·1 cites·16 claims
- 1670US8018586B2Metrology of thin film devices using an addressable micromirror arrayAPPLIED MATERIALS INC·Filed 2009·Granted Sep 13, 2011·5 cites·7 claims
- 1768US8698889B2Metrology system for imaging workpiece surfaces at high robot transfer speedsRAVID ABRAHAM·Filed 2010·Granted Apr 15, 2014·3 cites·22 claims
- 1868US7136163B2Differential evaluation of adjacent regions for change in reflectivityAPPLIED MATERIALS INC·Filed 2003·Granted Nov 14, 2006·7 cites·34 claims
- 1967US11609183B2Methods and systems to measure properties of products on a moving blade in electronic device manufacturing machinesAPPLIED MATERIALS INC·Filed 2020·Granted Mar 21, 2023·0 cites·19 claims
- 2065US9335151B2Film measurementAPPLIED MATERIALS INC·Filed 2012·Granted May 10, 2016·2 cites·42 claims
- 2165US7190458B2Use of scanning beam for differential evaluation of adjacent regions for change in reflectivityAPPLIED MATERIALS INC·Filed 2003·Granted Mar 13, 2007·11 cites·40 claims
- 2264US12211717B2Spatial pattern loading measurement with imaging metrologyAPPLIED MATERIALS INC·Filed 2021·Granted Jan 28, 2025·0 cites·20 claims
- 2360US10527407B2In-situ metrology method for thickness measurement during PECVD processesAPPLIED MATERIALS INC·Filed 2019·Granted Jan 7, 2020·0 cites·20 claims
- 2460US7911603B2Spectrometric metrology of workpieces using a permanent window as a spectral referenceAPPLIED MATERIALS INC·Filed 2009·Granted Mar 22, 2011·2 cites·19 claims
- 2558US10522375B2Monitoring system for deposition and method of operation thereofAPPLIED MATERIALS INC·Filed 2017·Granted Dec 31, 2019·0 cites·12 claims
- 2657US10234261B2Fast and continuous eddy-current metrology of a conductive filmAPPLIED MATERIALS INC·Filed 2013·Granted Mar 19, 2019·0 cites·11 claims
- 2755US2013095579A1Method and apparatus for the formation of solar cells with selective emittersAPPLIED MATERIALS ITALIA SRL·Filed 2012·Application pending·0 cites
- 2851US11226234B2Spectrum shaping devices and techniques for optical characterization applicationsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 18, 2022·0 cites·19 claims
- 2949US12062583B2Optical metrology models for in-line film thickness measurementsAPPLIED MATERIALS ISRAEL LTD·Filed 2021·Granted Aug 13, 2024·0 cites·19 claims
- 3049US8027031B2Spectrometric metrology of workpieces using a permanent window as a spectral referenceAPPLIED MATERIALS INC·Filed 2011·Granted Sep 27, 2011·0 cites·17 claims
- 3148US2011033957A1Integrated thin film metrology system used in a solar cell production lineAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3242US8130373B2Metrology of thin film devices using an addressable micromirror arrayGENIO EDGAR·Filed 2011·Granted Mar 6, 2012·0 cites·19 claims
- 3342US2015203966A1Measurement of film thickness on an arbitrary substrateAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 3441US2006114478A1Evaluating effects of tilt angle in ion implantationAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 3536US2018074311A1Enhanced illumination efficiency in maskless, programmable optical lithography systemsAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →